Fluorine-containing compound, substrate for patterning, photodegradable coupling agent, patterning method, and compound

A method for producing a fluorine-containing compound represented by the following General formula (1):

• wherein
• X represents a halogen atom or an alkoxy group,
• R1 represents a hydrogen atom or a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms,
• Rf1 and Rf2 are each independently a fluorinated alkoxy group, and
• n represents an integer of 0 or more,
• the method comprising:
• performing a first reaction represented by following formula 1:
• after the first reaction, performing a second reaction represented by following formula 1-1:
• after the second reaction, performing a third reaction represented by following formula 1-2:
• after the third reaction, performing a fourth reaction represented by following formula 1-3:
• after the fourth reaction, performing a fifth reaction represented by following formula 2:
• wherein
• Rf1′ and Rf2′ are each independently a fluorinated alkyl group,
• X represents a halogen atom or an alkoxy group,
• R1 represents a hydrogen atom or a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms,
• Rf1 and Rf2 are each independently a fluorinated alkoxy group, and
• n represents an integer of 0 or more.