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US 11,518,730 B2Granted
Polymer compositions for self-assembly applications
AssigneeMerck Patent GmbH
InventorsHengpeng Wu, Jian Yin, Guanyang Lin
Life of this patent
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Abstract
The present invention relates to a composition comprises at least one random copolymer having at least one repeat unit of structure (1), The present invention also relates to novel processes for forming patterns using this novel crosslinked layer on a substrate by enable a film of a block copolymer coated on the novel crosslinked layer to undergo self-assembly.
Claims29
A composition comprising at least one random copolymer having at least one repeat unit of structure (1),
- where (i) R1 is selected from a group consisting of H, C-1 to C-4 alkyl, a C-1 to C-4 fluoroalkyl, and a halide;
- (ii) R2 is selected from the group consisting of H, F, C-1 to C-8 alkyl and a C-1 to C-8 fluoroalkyl and where m ranges from 1 to 3;
- and (iii) G in structure (1) is a C-2 to C-10 alkylene moiety.
Dependencies are inferred from the claim text.