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US 11,512,396 B2Granted
Method for doping using electric field
AssigneeKorea University Research and Business Foundation
InventorsTaegeun Kim, Kyungrock Son
Life of this patent
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Abstract
A doping method using an electric field includes stacking a sacrificial layer on a doped layer, disposing a doping material on the sacrificial layer, disposing electrodes on the doping material and the doped layer, respectively, and doping the doping material into the doped layer through oxidation, diffusion, and reduction of the doping material by the electric field.
Claims9
A doping method using an electric field comprising:
- stacking a sacrificial layer on a doped layer;
- disposing a doping material on the sacrificial layer;
- disposing electrodes on the doping material and the doped layer, respectively;
- and
- doping the doping material into the doped layer through oxidation, diffusion, and reduction of the doping material by the electric field.
2 more elements
Dependencies are inferred from the claim text.