Radiation-sensitive composition and resist pattern-forming method
AssigneeJsr Corporation
InventorsHisashi Nakagawa, Yusuke Asano, Shinya Minegishi
Life of this patent
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Abstract
A radiation-sensitive composition contains: a polymetalloxane including a structural unit represented by formula (1); a radiation-sensitive acid generator; and a solvent. In the following formula (1), M represents a germanium atom, a tin atom or a lead atom; Ar1 represents a substituted or unsubstituted aryl group having 6 to 20 ring atoms or a substituted or unsubstituted heteroaryl group having 5 to 20 ring atoms; R1 represents a monovalent organic group having 1 to 20 carbon atoms, a hydrogen atom, a halogen atom or a hydroxy group; and n is 2 or 3.
Claims20
A radiation-sensitive composition, comprising:
- a solvent;
- a radiation-sensitive acid generator;
- and
- a polymetalloxane comprising a structural unit of formula (1),
- wherein M is a tin atom or a lead atom, Ar1 is a substituted or unsubstituted aryl group having 6 to 20 ring atoms, or a substituted or unsubstituted heteroaryl group having 5 to 20 ring atoms, R1 is a monovalent organic group having 1 to 20 carbon atoms, a hydrogen atom, a halogen atom or a hydroxy group, n is 2 or 3, and a lower limit of a content of the polymetalloxane comprising the structural unit of formula (1) is 50% by mass with respect to a total solid content in the radiation-sensitive composition.
Dependencies are inferred from the claim text.