Gamma irradiation of ion exchange resins to remove or trap halogenated impurities
AssigneeEvoqua Water Technologies LLC
InventorMarty Wilkes
Life of this patent
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Abstract
A method of producing treated ion exchange resin material includes exposing an enclosed vessel containing ion exchange resin and a pre-treatment solution to high energy radiation. The treated ion exchange resin material has reduced organic impurities or total organic carbon (TOC).
Claims18
A high energy radiation treated ion exchange resin material having reduced organic impurities and being capable of purifying an ultrapure water solution to contain less than about 1.0 ppb chloride compounds, less than about 1.0 ppb sulfide compounds, and less than about 10 ppb total organic carbon compounds,
- the treated ion exchange resin material comprising an anion exchange resin having reduced organochloride compounds;
- and/or
- the treated ion exchange resin material comprising a cation exchange resin having reduced organosulfonate compounds.
A method of obtaining a reduced chloride and sulfate concentration in a solution comprising:
- exposing ion exchange resin in a vessel comprising a pre-treatment solution and void space to high energy radiation to produce a treated ion exchange resin material having reduced organic impurities and a treated void space having reduced volatile organic species;
- providing a solution and contacting the solution with the treated ion exchange resin material having reduced organic impurities.
Dependencies are inferred from the claim text.