Monoalkyl tin trialkoxides and/or monoalkyl tin triamides with particulate contamination and corresponding methods
AssigneeInpria Corporation
InventorsBenjamin L. Clark, Dominick Smiddy, Mark Geniza, Craig M. Gates
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Abstract
The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and/or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.
Claims10
A composition comprising a solvent and monoalkyl tin trialkoxide (RSn(OR′)3) or monoalkyl tin triamide (RSn(NR′2)3) with a tin concentration from about 0.005M to about 0.5M dissolved in the solvent, wherein the composition has a particle contamination of no more than about 40 particles per mL with a particle size of at least about 70 nm as determined by light scattering.
Dependencies are inferred from the claim text.