Polishing method and polishing pad
AssigneeFujimi Incorporated
InventorsToru Kamada, Koji Katayama, Hitoshi Morinaga, Takashi Horibe
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AssigneeFujimi Incorporated
InventorsToru Kamada, Koji Katayama, Hitoshi Morinaga, Takashi Horibe
Estimating the term…
A disc-shaped polishing pad (1) is used for a polishing method of the present invention. The polishing pad (1) has a peripheral surface (111) on a polishing surface (10) side in an axial direction of the disc of a tapered surface whose diameter is reduced to the polishing surface (10). An angle formed by the peripheral surface (111) and the polishing surface (10) is 125° or more and less than 180°. The polishing pad (1) has a hardness immediately after a pressing surface is in close contact of 40 or more by a testing method specified in an appendix 2 of JIS K7312: 1996, “Spring Hardness Test Type C Testing Method”. A slurry containing abrasives is supplied to a polished surface larger than the polishing surface (10). The polishing surface (10) is pressed against the polished surface and the polishing pad (1) is moved to polish the polished surface.
A polishing method comprising:
A polishing method comprising:
A polishing method comprising:
Dependencies are inferred from the claim text.