Semiconductor device
AssigneeInfineon Technologies AG
InventorJoost Adriaan Willemen
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AssigneeInfineon Technologies AG
InventorJoost Adriaan Willemen
Estimating the term…
A semiconductor device includes a composite pn-junction structure in a semiconductor substrate, wherein the composite pn-junction structure has a first junction grading coefficient m1, with m1≥0.50. The composite pn-junction structure includes a first partial pn-junction structure and a second partial pn-junction structure, wherein the first partial pn-junction structure has a first partial junction grading coefficient m11, and wherein the second partial pn-junction structure has a second partial junction grading coefficient m12. The first partial junction grading coefficient m11 is different to the second partial junction grading coefficient m12, with m11≠m12. At least one of the first and second partial junction grading coefficients m11, m12 is greater than 0.50, with m11 and/or m12>0.50. The first junction grading coefficient m1 of the composite pn-junction structure is based on a combination of the first and second partial junction grading coefficients m11, m12.
A semiconductor device comprising:
A semiconductor device comprising:
A method comprising:
Dependencies are inferred from the claim text.