Method for detecting environmental parameter in semiconductor fabrication facility

A detection vehicle for measurement of a condition of semiconductor fabrication facility, the detection vehicle comprising:

• a gas line fluidly connected to a processing tool for processing a semiconductor wafer;
• a metrology module fluidly connected to the gas line and configured to measure at least one parameter of a gas sample taken from the processing tool;
• and
• a vehicle driving module configured to move the detection vehicle in the semiconductor fabrication facility to connect the detection vehicle with another processing tool.

A method of monitoring a semiconductor fabrication facility, comprising:

• actuating a detection vehicle to move to a first sampling station, wherein the first sampling station is fluidly connected to a first group of processing tools;
• connecting a gas line of the detection vehicle to the first sampling station;
• collecting a first gas sample, through the first sampling station, from one of the first group of processing tools;
• and
• issuing a warning when a parameter in related to the first gas sample from the one of the first group of processing tools is out of a range of acceptable values associated with the one of the first group of processing tools.