Cavitand compositions and methods of use thereof
AssigneeGeorgetown University
InventorsKevin Travis Holman, Christopher Kane
Life of this patent
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Abstract
Cavitand compositions that comprise void spaces are disclosed. The void spaces may be empty, which means that voids are free of guest molecules or atoms, or the void spaces may comprise guest molecules or atoms that are normally in their gas phase at standard temperature and pressure. These cavitands may be useful for industrial applications, such as the separation or storage of gasses. Novel cavitand compounds are also disclosed.
Claims15
A composition comprising a compound of formula (I):
- and/or a stereoisomer thereof;
- wherein
- R is H, C1-C6 alkyl, halo, or NO2;
- R1 is H, C1-C6 alkyl, Ph, (C1-C6 alkyl)xPh, (C(halo)3)xPh, or (halo)xPh;
- Y is —Si(C1-C6 alkyl)2-;
- and
- x is an integer from 1-3, and
- wherein the composition is in a crystalline form that comprises void spaces of at least 15 Å3;
- and wherein the void spaces are free of other atoms and molecules.
A composition comprising a compound of formula (I):
- and/or a stereoisomer thereof;
- wherein the compound of formula (I) is selected from the following (R, R1, Y):
- (H, H, Si(CH3)2);
- (H, i-Bu, Si(CH3)2);
- (CH3, CH3, Si(CH3)2);
- (CH3, CH3CH2, Si(CH3)2);
- (CH3, H, Si(CH3CH2)2);
- (CH3, CH3, Si(CH3CH2)2);
- (H, H, Si(i-Pr)2);
- (H, CH3, Si(i-Pr)2);
- (CH3, H, Si(i-Pr)2);
- and (CH3, CH3, Si(i-Pr)2).
A composition comprising a compound of formula (I)
- and/or a stereoisomer thereof;
- wherein the composition is a host-guest complex, where at least some void spaces of the composition comprise one or more guest gas molecules or atoms, and
- wherein the compound of formula (I) is selected from the following (R, R1, Y):
- (H, H, Si(CH3)2);
- (H, i-Bu, Si(CH3)2);
- (CH3, CH3, Si(CH3)2);
- (CH3, CH3CH2, Si(CH3)2);
- (CH3, H, Si(CH3CH2)2);
- (CH3, CH3, Si(CH3CH2)2);
- (H, H, Si(i-Pr)2);
- (H, CH3, Si(i-Pr)2);
- (CH3, H, Si(i-Pr)2);
- and (CH3, CH3, Si(i-Pr)2).
A chemical compound of formula (IIa);
- and/or a stereoisomer thereof;
- wherein
- R4 is H, CH3, i-Bu, Ph, 4-CF3Ph, 3,5-(CF3)2Ph, or 3,5-F2Ph;
- and
- Z is —Si(CH3)2—, —Si(CH3CH2)2—, or —Si(i-Pr)2—;
- wherein R4 is not CH3 when Z is —Si(CH3)2—, or Si(CH3CH2)2.
A composition comprising a compound of formula (I):
- and/or a stereoisomer thereof;
- wherein
- R is H, C1-C6 alkyl, halo, or NO2;
- R1 is H, C1-C6 alkyl, Ph, (C1-C6 alkyl)xPh, (C(halo)3)xPh, or (halo)xPh;
- Y is Si(C1-C6 alkyl)2;
- and
- x is an integer from 1-3, provided that when Y is —Si(CH3)2— then R is not CH3 and R1 is not H, wherein the composition is in a crystalline form that comprises void spaces of at least 15 Å3;
- and wherein the void spaces are free of other atoms and molecules.
Dependencies are inferred from the claim text.