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US 11,480,878 B2Granted
Monomers, polymers and photoresist compositions
AssigneeRohm and Haas Electronic Materials Korea Ltd.
InventorsEui Hyun Ryu, Min Kyung Jang, Jung Woo Kim, Kwang-Mo Choi, Hyun Jeon, Woo-Hyung Lee, Myung-Yeol Kim
Life of this patent
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Abstract
In one preferred embodiment, polymers are provided that comprise a structure of the following Formula (I): Photoresists that comprises such polymers also are provided.
Claims18
A polymer comprising a structure of the following Formula (I):
- wherein:
- X and X′ are the same or different linker;
- R is a non-hydrogen substituent;
- and
- A and B are each independently hydrogen or fluorine;
- R′ and R″ are each independently hydrogen or a non-hydrogen substituent,
- with at least one of R′ and R″ being a non-hydrogen substituent other than a halogen or a halogen-substituted group.
4 more elements
A polymer comprising a polymerized monomer of one of the following structures:
Dependencies are inferred from the claim text.