Electrostatic chuck and plasma processing apparatus
AssigneeTokyo Electron Limited
InventorsShin Yamaguchi, Akiyoshi Mitsumori
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Abstract
An electrostatic chuck of an embodiment includes a base, a dielectric layer, and a chuck main body. The dielectric layer is provided on the base, and is fixed to the base. The chuck main body is mounted on the dielectric layer. The chuck main body has a ceramic main body, a first electrode, a second electrode, and a third electrode. The ceramic main body has a substrate mounting region. The first electrode is provided in the substrate mounting region. The second electrode and the third electrode form a bipolar electrode. The second electrode and the third electrode are provided in the ceramic main body, and are provided between the first electrode and the dielectric layer.
Claims6
An electrostatic chuck, comprising:
- a base;
- a dielectric layer provided on the base;
- and
- a ceramic layer mounted on the dielectric layer and having a substrate support surface;
- a first electrostatic electrode provided in the ceramic layer;
- and
- a second electrostatic electrode and a third electrostatic electrode forming a bipolar electrode, provided in the ceramic layer, and provided between the first electrode and the dielectric layer.
Dependencies are inferred from the claim text.