Quartz glass crucible and manufacturing method thereof

A quartz glass crucible used for pulling up a silicon single crystal by a Czochralski method, comprising:

• a cylindrical crucible body which has a bottom and is made of quartz glass;
• and
• first and second crystallization-accelerator-containing coating films which are respectively formed on an inner surface of the crucible body and an outer surface of the crucible body so as to cause a ratio ti/to, of a thickness ti of an inner crystal layer formed on the inner surface of the crucible body to a thickness to of an outer crystal layer formed on the outer surface of the crucible body by heating during a step of pulling up the silicon single crystal, to be 0.3 or more and 5 or less,
• wherein each of the first and second crystallization-accelerator-containing coating films is a non-heated polymer film formed of:
• (i) a barium compound which is insoluble in water, and (ii) a thickener composed of a polymer in which the barium compound diffuses.

A quartz glass crucible used for pulling up a silicon single crystal by a Czochralski method, comprising:

• a cylindrical crucible body which has a bottom and is made of quartz glass;
• and
• a crystallization-accelerator-containing coating film which is formed on an inner surface of the crucible body so as to cause an inner crystal layer to be formed on the inner surface of the crucible body by heating during a step of pulling up the silicon single crystal,
• wherein the crystallization-accelerator-containing coating film is a non-heated polymer film formed of:
• (i) a barium compound which is insoluble in water, and (ii) a thickener composed of a polymer in which the barium compound diffuses, and
• wherein a ratio ηo/ηi of a glass viscosity ηo on an outer surface side to a glass viscosity ηi on an inner surface side of the crucible body at a heating temperature during the step of pulling up is 0.5 or more and 10 or less.

A quartz glass crucible used for pulling up a silicon single crystal by a Czochralski method, comprising:

• a cylindrical crucible body which has a bottom and is made of quartz glass;
• and
• a crystallization-accelerator-containing coating film which is formed on an outer surface of the crucible body so as to cause an outer crystal layer to be formed on the outer surface of the crucible body by heating during a step of pulling up the silicon single crystal,
• wherein the crystallization-accelerator-containing coating film is a non-heated polymer film formed of:
• (i) a barium compound which is insoluble in water, and (ii) a thickener composed of a polymer in which the barium compound diffuses, and
• wherein a ratio ηi/ηo of a glass viscosity ηi on an inner surface side to a glass viscosity ηo on an outer surface side of the crucible body at a heating temperature during the step of pulling up is 0.5 or more.

A manufacturing method of a quartz glass crucible comprising steps of:

• manufacturing a cylindrical crucible body which has a bottom and is made of quartz glass;
• and
• forming a crystallization-accelerator-containing coating film on an inner surface or an outer surface of the crucible body so as to cause a crystallization-accelerator-enriched layer to be formed in the vicinity of a surface of at least one of the inner surface and the outer surface of the crucible body by heating during a step of pulling up a silicon single crystal,
• wherein the crystallization-accelerator-containing coating film is a non-heated polymer film formed of:
• (i) a barium compound which is insoluble in water, and (ii) a thickener composed of a polymer in which the barium compound diffuses.

A manufacturing method of a quartz glass crucible comprising steps of:

• manufacturing a cylindrical crucible body which has a bottom and is made of quartz glass;
• forming a first crystallization-accelerator containing-coating film on an inner surface of the crucible body so as to an inner crystal layer to be formed on the inner surface of the crucible body by heating during a step of pulling up a silicon single crystal;
• and
• forming a second crystallization-accelerator-containing coating film on an outer surface of the crucible body so as to an outer crystal layer having a thickness to to be formed on the outer surface of the crucible body by heating during a step of pulling up the silicon single crystal,
• wherein each of the first and second crystallization-accelerator-containing coating films is a non-heated polymer film formed of:
• (i) a barium compound which is insoluble in water, and (ii) a thickener composed of a polymer in which the barium compound diffuses, and
• wherein the steps of forming the first and second crystallization-accelerator-containing coating films include a step of applying crystallization accelerators in which concentrations of the crystallization accelerators are adjusted so as to cause a ratio ti/to of a thickness ti of the inner crystal layer to the thickness to of the outer crystal layer to be 0.3 or more and 5 or less.

A manufacturing method of a quartz glass crucible comprising steps of:

• manufacturing a cylindrical crucible body which has a bottom and is made of quartz glass;
• and
• forming a crystallization-accelerator-containing coating film on an inner surface of the crucible body so as to cause an inner crystal layer to be formed on the inner surface of the crucible body by heating during a step of pulling up a silicon single crystal,
• wherein the crystallization-accelerator-containing coating film is a non-heated polymer film formed of:
• (i) a barium compound which is insoluble in water, and (ii) a thickener composed of a polymer in which the barium compound diffuses, and
• wherein the step of manufacturing the crucible body includes a step of subjecting raw material quartz powders to arc melting in a rotating mold, and
• types of the raw material quartz powder forming an inner surface side of the crucible body and the raw material quartz powder forming an outer surface side of the crucible are changed so as to cause a ratio ηo/ηi of a glass viscosity ηo on the outer surface side of the crucible body to a glass viscosity ηi on the inner surface side of the crucible body at a heating temperature during the step of pulling up to be 0.5 or more and 10 or less.

A manufacturing method of a quartz glass crucible comprising steps of:

• manufacturing a cylindrical crucible body which has a bottom and is made of quartz glass;
• and
• forming a crystallization-accelerator-containing coating film on an outer surface of the crucible body so as to cause an outer crystal layer to be formed on the outer surface of the crucible body by heating during a step of pulling up a silicon single crystal,
• wherein the crystallization-accelerator-containing coating film is a non-heated polymer film formed of:
• (i) a barium compound which is insoluble in water, and (ii) a thickener composed of a polymer in which the barium compound diffuses, and
• wherein the step of manufacturing the crucible body includes a step of subjecting raw material quartz powders to arc melting in a rotating mold, and
• types of the raw material quartz powder forming an inner surface side of the crucible body and the raw material quartz powder forming an outer surface side of the crucible are changed so as to cause a ratio ηi/ηo of a glass viscosity ηi on the inner surface side of the crucible body to a glass viscosity ηo on the outer surface side of the crucible body at a heating temperature during the step of pulling up to be 0.5 or more.

A quartz glass crucible used for pulling up a silicon single crystal by a Czochralski method, comprising:

• a cylindrical crucible body which has a bottom and is made of quartz glass;
• and
• first and second crystallization-accelerator-containing coating films which are respectively formed on an inner surface of the crucible body and an outer surface of the crucible body so as to cause a ratio ti/to, of a thickness ti of an inner crystal layer formed on the inner surface of the crucible body to a thickness to of an outer crystal layer formed on the outer surface of the crucible body by heating during a step of pulling up the silicon single crystal, to be 0.3 or more and 5 or less,
• wherein in-plane gradients of concentrations of crystallization accelerators in the first and second crystallization-accelerator-containing coating films are 40% or more and 150% or less.

A quartz glass crucible used for pulling up a silicon single crystal by a Czochralski method, comprising:

• a cylindrical crucible body which has a bottom and is made of quartz glass;
• and
• a crystallization-accelerator-containing coating film which is formed on an inner surface of the crucible body so as to cause an inner crystal layer to be formed on the inner surface of the crucible body by heating during a step of pulling up the silicon single crystal,
• wherein an in-plane concentration gradient of a crystallization accelerator in the crystallization-accelerator-containing coating film is 40% or more and 150% or less, and
• wherein a ratio ηo /ηi of a glass viscosity ηo on an outer surface side to a glass viscosity ηi on an inner surface side of the crucible body at a heating temperature during the step of pulling up is 0.5 or more and 10 or less.

A quartz glass crucible used for pulling up a silicon single crystal by a Czochralski method, comprising:

• a cylindrical crucible body which has a bottom and is made of quartz glass;
• and
• a crystallization-accelerator-containing coating film which is formed on an outer surface of the crucible body so as to cause an outer crystal layer to be formed on the outer surface of the crucible body by heating during a step of pulling up the silicon single crystal,
• wherein an in-plane concentration gradient of a crystallization accelerator in the crystallization-accelerator-containing coating film is 40% or more and 150% or less, and
• wherein a ratio ηi/ηo of a glass viscosity ηi on an inner surface side to a glass viscosity ηo on an outer surface side of the crucible body at a heating temperature during the step of pulling up is 0.5 or more.