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US 11,467,339 B2Granted
Radiation source and a method for use in metrology applications
AssigneeASML Netherlands B.V.
InventorsHendrik Sabert, Patrick Sebastian Uebel
Life of this patent
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Abstract
A system and method for providing a radiation source. In one arrangement, the radiation source includes an optical fiber that is hollow, and has an axial direction, a gas that fills the hollow of the optical fiber, and a plurality of temperature setting devices disposed at respective positions along the axial direction of the optical fiber, wherein the temperature setting devices are configured to control the temperature of the gas to locally control the density of the gas.
Claims20
A radiation source, comprising:
- an optical fiber that is hollow, and has an axial direction;
- and
- one or more temperature setting devices,
- wherein the one or more temperature devices are configured to control a temperature of a gas so as to control the density of gas that fills the hollow of the optical fiber.
1 more element
A radiation source, comprising:
- an optical fiber that is hollow, and has an axial direction, the optical fiber located in a first chamber;
- and
- one or more temperature setting devices, the one or more temperature setting devices configured to change a pressure of gas in a second chamber,
- wherein the change of pressure is communicated to the first chamber via a fluid connection between the first and second chambers.
1 more element
A radiation source, comprising:
- an optical fiber that is hollow, and has an axial direction;
- and
- one or more temperature setting devices configured to change a pressure of gas,
- wherein the change of pressure is applied to gas that fills the hollow of the optical fiber.
1 more element
Dependencies are inferred from the claim text.