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US 11,466,787 B2Granted
Switching valve, valve apparatus, holding apparatus, lithography apparatus, and method of manufacturing article
AssigneeCanon Kabushiki Kaisha
InventorYusuke Shiomura
Life of this patent
Estimating the term…
Abstract
The present invention provides a switching valve comprising: a housing including a first port, a second port, and a third port; a valve element configured to be movable in the housing so as to selectively allow one of the first port and the second port to communicate with the third port in accordance with a pressure difference between the first port and the second port; and a pressing member configured to press the valve element toward a side of the first port.
Claims7
A valve apparatus configured to assist in changing a pressure in a first space, the valve apparatus comprising:
- a non-return valve;
- and
- a switching valve comprising:
- a housing including a first port, a second port, and a third port;
- a valve element configured to be movable in the housing so as to selectively allow one of the first port or the second port to communicate with the third port in accordance with a pressure difference between the first port and the second port;
- and
- a pressing member configured to press the valve element toward a side of the first port,
- wherein the first port and the third port of the switching valve communicate with the first space,
- wherein the second port of the switching valve communicates with a second space isolated from the first space, and
- wherein the non-return valve is arranged in a flow passage between the first space and the third port so as to allow a flow of gas from the first space to the third port but prevent the flow of gas from the third port to the first space.
7 more elements
A holding apparatus that holds an object, the holding apparatus comprising:
- a holding member including a first space, which is a closed space by arranging the object;
- a controller configured to control holding and releasing of the object by the holding member by changing a pressure in the first space;
- and
- a valve apparatus including a non-return valve and a switching valve, and configured to assist in changing the pressure in the first space by the controller,
- wherein the switching valve comprises:
- a housing including a first port, a second port, and a third port;
- a valve element configured to be movable in the housing so as to selectively allow one of the first port or the second port to communicate with the third port in accordance with a pressure difference between the first port and the second port;
- and
- a pressing member configured to press the valve element toward a side of the first port,
- wherein the first port and the third port of the switching valve communicate with the first space,
- wherein the second port of the switching valve communicates with a second space isolated from the first space, and
- wherein the non-return valve is arranged in a flow passage between the first space and the third port so as to allow a flow of gas from the first space to the third port but prevent the flow of gas from the third port to the first space.
9 more elements
A lithography apparatus that forms a pattern on a substrate, the lithography apparatus comprising:
- a holding apparatus configured to hold the substrate and comprising:
- a holding member including a first space, which is a closed space by arranging the object;
- a controller configured to control holding and releasing of the object by the holding member by changing a pressure in the first space;
- and
- a valve apparatus including a non-return valve and a switching valve, and configured to assist in changing the pressure in the first space by the controller,
- wherein the switching valve comprises:
- a housing including a first port, a second port, and a third port;
- a valve element configured to be movable in the housing so as to selectively allow one of the first port or the second port to communicate with the third port in accordance with a pressure difference between the first port and the second port;
- and
- a pressing member configured to press the valve element toward a side of the first port,
- wherein the first port and the third port of the switching valve communicate with the first space,
- wherein the second port of the switching valve communicates with a second space isolated from the first space, and
- wherein the non-return valve is arranged in a flow passage between the first space and the third port so as to allow a flow of gas from the first space to the third port but prevent the flow of gas from the third port to the first space.
10 more elements
A method of manufacturing an article, the method comprising:
- forming a pattern on a substrate using a lithography apparatus that comprises a holding apparatus configured to hold the substrate;
- processing the substrate, on which the pattern has been formed, to manufacture the article,
- wherein the holding apparatus comprises:
- a holding member including a first space, which is a closed space by arranging the object;
- a controller configured to control holding and releasing of the object by the holding member by changing a pressure in the first space;
- and
- a valve apparatus including a non-return valve and a switching valve, and configured to assist in changing the pressure in the first space by the controller,
- wherein the switching valve comprises:
- a housing including a first port, a second port, and a third port;
- a valve element configured to be movable in the housing so as to selectively allow one of the first port or the second port to communicate with the third port in accordance with a pressure difference between the first port and the second port;
- and
- a pressing member configured to press the valve element toward a side of the first port,
- wherein the first port and the third port of the switching valve communicate with the first space,
- wherein the second port of the switching valve communicates with a second space isolated from the first space, and
- wherein the non-return valve is arranged in a flow passage between the first space and the third port so as to allow a flow of gas from the first space to the third port but prevent the flow of gas from the third port to the first space.
12 more elements
Dependencies are inferred from the claim text.