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US 11,456,412 B2Granted
Ruthenium removal composition and method of producing magnetoresistive random access memory
AssigneeFUJIFILM Corporation
InventorsKeeyoung Park, Atsushi Mizutani
Life of this patent
Estimating the term…
Abstract
A treatment liquid contains orthoperiodic acid and water, and the pH is 11 or more. It is preferable that the content of orthoperiodic acid in the treatment liquid is 0.01% to 5% by mass with respect to the total mass of the treatment liquid.
Claims8
A treatment liquid for semiconductor substrate, consisting of:
- orthoperiodic acid;
- water in an amount of at least 90% by mass with respect to a total mass of the treatment liquid;
- and
- an alkanolamine represented by the following Formula (P-1),
- wherein, in Formula (P-1), RP1 represents a group represented by the following Formula (x) that has hydroxyl group (OH), and optionally has a substituent selected from a carboxyl group (COOH), a sulfanyl group (SH), an alkoxy group, or a thioalkoxy group;
- X1-(Rx1-X2)mx-Rx2-* (x)
- wherein, in Formula (x), X1 represents a hydroxyl group, a sulfanyl group, an alkoxy group having 1 to 4 carbon atoms, or a thioalkoxy group having 1 to 4 carbon atoms;
- Rx1 and Rx2 each independently represent an alkylene group having 1 to 6 carbon atoms, an alkenylene group having 2 to 6 carbon atoms, an alkynylene group having 2 to 6 carbon atoms, an arylene group having 6 to 10 carbon atoms, or a group obtained by combining two or more these groups;
- X2 represents O, S, CO or NR, wherein RN represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms;
- mx represents an integer of 0 to 6;
- and a symbol “*” indicates a bonding to a nitrogen atom in Formula (P-1),
- wherein when mx is 2 or greater, a plurality of Rx1's and X2's may be the same or different from each other,
- wherein each of Rx1 and Rx2 optionally has a substituent selected from a hydroxyl group (OH), a carboxyl group (COOH), a sulfanyl group (SH), an alkoxy group, or a thioalkoxy group,
- wherein, in Formula (x), X1 represents a hydroxyl group, Rx1 has a hydroxyl group as a substituent, Rx2 has a hydroxyl group as a substituent, or any combination thereof, and
- wherein the treatment liquid has a pH of 12 or more.
12 more elements
A treatment liquid for semiconductor substrate, consisting of:
- orthoperiodic acid;
- water in an amount of at least 90% by mass with respect to a total mass of the treatment liquid;
- and
- an alkanolamine represented by the following Formula (P-1),
- wherein, in Formulae (P-1), RP1 represents a group represented by the following Formula (x) that has a hydroxyl group (OH), and optionally has a substituent selected from a carboxyl group (COOH), a sulfanyl group (SH), an alkoxy group, or a thioalkoxy group;
- X1-(Rx1-X2)mx-Rx2-* (x)
- wherein, in Formula (x), X1 represents a hydroxyl group, a sulfanyl group, an alkoxy group having 1 to 4 carbon atoms, or a thioalkoxy group having 1 to 4 carbon atoms;
- Rx1 and Rx2 each independently represent an alkylene group having 1 to 6 carbon atoms, an alkenylene group having 2 to 6 carbon atoms, an alkynylene group having 2 to 6 carbon atoms, an arylene group having 6 to 10 carbon atoms, or a group obtained by combining two or more these groups;
- X2 represents O, S, CO or NRN, wherein RN represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms;
- mx represents an integer of 0 to 6;
- and a symbol “*” indicates a bonding to a nitrogen atom in Formula (P-1),
- wherein when nix is 2 or greater, a plurality of Rx1's and X2's may be the same or different from each other,
- wherein Rx1 and Rx2 optionally has a substituent selected from a hydroxyl group (OH), a carboxyl group (COOH), a sulfanyl group (SH), an alkoxy group, or a thioalkoxy group,
- wherein, in Formula (x), X1 represents a hydroxyl group, Rx1 has a hydroxyl group as a substituent, Rx2 has a hydroxyl group as a substituent, or any combination thereof, and
- wherein the treatment liquid has a pH of 11 or more.
12 more elements
A treatment liquid for semiconductor substrate, consisting of:
- orthoperiodic acid;
- water in an amount of at least 90% by mass with respect to a total mass of the treatment liquid;
- quaternary ammonium hydroxide;
- and
- an alkanolamine represented by the following Formula (P-1),
- wherein, in Formula (P-1), RP1 represents a group represented by the following Formula (x) that has a substituent selected from a hydroxyl group (OH), and optionally has a substituent selected from a carboxyl group (COOH), a sulfanyl group (SH), an alkoxy group, or a thioalkoxy group;
- X1-(Rx1-X2)mx-Rx2-* (x)
- wherein, in Formula (x), X1 represents a hydroxyl group, a sulfanyl group, an alkoxy group having 1 to 4 carbon atoms, or a thioalkoxy group having 1 to 4 carbon atoms;
- Rx1 and Rx2 each independently represent an alkylene group having 1 to 6 carbon atoms, an alkenylene group having 2 to 6 carbon atoms, an alkynylene group having 2 to 6 carbon atoms, an arylene group having 6 to 10 carbon atoms, or a group obtained by combining two or more these groups;
- X2 represents O, S, CO or NRN, wherein RN represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms;
- mx represents an integer of 0 to 6;
- and a symbol “*” indicates a bonding to a nitrogen atom in Formula (P-1),
- wherein when mx is 2 or greater, a plurality of Rx1's and X2's may be the same or different from each other,
- wherein Rx1 and Rx2 optionally has a substituent selected from a hydroxyl group (OH), a carboxyl group (COOH), a sulfanyl group (SH), an alkoxy group, or a thioalkoxy group,
- wherein, in Formula (x), X1 represents a hydroxyl group, Rx1 has a hydroxyl group as a substituent, Rx2 has a hydroxyl group as a substituent, or any combination thereof, and
- wherein the treatment liquid has a pH of 11 or more.
13 more elements
Dependencies are inferred from the claim text.