Light irradiation type heat treatment method and heat treatment apparatus

A heat treatment method of heating a substrate by irradiating said substrate with light, comprising steps of:

• (a) transporting a substrate into a chamber to make a susceptor hold the substrate;
• (b) irradiating the substrate held by the susceptor with light from continuous lighting lamps;
• (c) measuring a temperature of the substrate with a first radiation thermometer;
• (d) measuring a temperature of the susceptor with a second radiation thermometer;
• and
• (e) determining that the substrate bows when a specific singular point appears in a temporal differentiation in a temperature measured with the first radiation thermometer or a temporal differentiation in a temperature measured with the second radiation thermometer, wherein
• in the step of (e), the determination is performed in accordance with the temporal differentiation in the temperature measured with the second radiation thermometer when the temperature of the substrate increased in accordance with a light irradiation is smaller than a predetermined value, and the determination is performed in accordance with the temporal differentiation in the temperature measured with the first radiation thermometer when the temperature of the substrate is equal to or larger than predetermined value.

A heat treatment method of heating a substrate by irradiating said substrate with light, comprising steps of:

• (a) transporting a substrate into a chamber to make a susceptor hold the substrate;
• (b) irradiating the substrate held by the susceptor with light from continuous lighting lamps;
• (c) measuring a temperature of the substrate with a first radiation thermometer;
• (d) measuring a temperature of the susceptor with a second radiation thermometer;
• and
• (e) determining that the substrate bows when a specific singular point appears in a temporal differentiation in a temperature measured with the first radiation thermometer or a temporal differentiation in a temperature measured with the second radiation thermometer, wherein
• in the step of (e), it is determined that the substrate bows when a specific singular point appears in a temporal differentiation in a temperature measured with the first radiation thermometer and a temporal differentiation in a temperature measured with the second radiation thermometer.

A heat treatment method of heating a substrate by irradiating said substrate with light, comprising steps of:

• (a) transporting a substrate into a chamber to make a susceptor hold the substrate;
• (b) irradiating the substrate held by the susceptor with light from continuous lighting lamps;
• (c) measuring a temperature of the substrate with a first radiation thermometer;
• (d) measuring a temperature of the susceptor with a second radiation thermometer;
• (e) determining that the substrate bows when a specific singular point appears in a temporal differentiation in a temperature measured with the first radiation thermometer or a temporal differentiation in a temperature measured with the second radiation thermometer, and
• (f) irradiating the substrate with a flash of light from flash lamps after the step of (b), wherein
• when it is determined that the substrate bows in the step of (e), the irradiation of the substrate with the flash of light is omitted, and the substrate is transported out of the chamber, and a substrate subsequent to the substrate is transported into the chamber.

A heat treatment method of heating a substrate by irradiating said substrate with light, comprising steps of:

• (a) transporting a substrate into a chamber to make a susceptor hold the substrate;
• (b) irradiating the substrate held by the susceptor with light from continuous lighting lamps;
• (c) measuring a temperature of the substrate with a radiation thermometer;
• and
• (d) determining that the substrate bows when a specific singular point appears in a temporal differentiation in a temperature measured with the radiation thermometer,
• wherein in the step of (d), it is determined that the substrate bows when the temporal differentiation in the temperature measured with the radiation thermometer changes to a value equal to or larger than a threshold value.

A heat treatment method of heating a substrate by irradiating said substrate with light, comprising steps of:

• (a) transporting a substrate into a chamber to make a susceptor hold the substrate;
• (b) irradiating the substrate held by the susceptor with light from continuous lighting lamps;
• (c) measuring a temperature of the susceptor with a radiation thermometer;
• and
• (d) determining that the substrate bows when a specific singular point appears in a temporal differentiation in a temperature measured with the radiation thermometer,
• wherein in the step of (d), it is determined that the substrate bows when the temporal differentiation in the temperature measured with the radiation thermometer changes to a value equal to or larger than a threshold value.

A heat treatment method of heating a substrate by irradiating said substrate with light, comprising steps of:

• (a) transporting a substrate into a chamber to make a susceptor hold the substrate;
• (b) irradiating the substrate held by the susceptor with light from continuous lighting lamps;
• (c) measuring a temperature of the substrate with a radiation thermometer;
• (d) determining that the substrate bows when a specific singular point appears in a temporal differentiation in a temperature measured with the radiation thermometer, and
• (e) irradiating the substrate with a flash of light from flash lamps after the step of (b), wherein
• when it is determined that the substrate bows in the step of (d), the irradiation of the substrate with the flash of light is omitted, and the substrate is transported out of the chamber, and a substrate subsequent to the substrate is transported into the chamber.

A heat treatment method of heating a substrate by irradiating said substrate with light, comprising steps of:

• (a) transporting a substrate into a chamber to make a susceptor hold the substrate;
• (b) irradiating the substrate held by the susceptor with light from continuous lighting lamps;
• (c) measuring a temperature of the susceptor with a radiation thermometer;
• and
• (d) determining that the substrate bows when a specific singular point appears in a temporal differentiation in a temperature measured with the radiation thermometer, and
• (e) irradiating the substrate with a flash of light from flash lamps after the step of (b), wherein
• when it is determined that the substrate bows in the step of (d), the irradiation of the substrate with the flash of light is omitted, and the substrate is transported out of the chamber, and a substrate subsequent to the substrate is transported into the chamber.