Substrate support pedestal
AssigneeApplied Materials, Inc.
InventorsSteven Joseph Larosa, Stephen Prouty
Life of this patent
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Abstract
The systems and methods discussed herein are associated with substrate support pedestals used in processing chambers to manufacture semiconductors, electronics, optics, and other devices. The substrate support pedestals include an electrostatic chuck body bonded to a cooling base via a bond layer. A gas flow passage is formed between a top surface of the electrostatic chuck body and a bottom surface of the cooling base, and a porous plug is positioned in the gas flow passage. The gas flow passage passes through a hole in the bond layer and the porous plug and has a swept volume physically shielded from an inside edge of the hole in the bond layer, protecting the bond layer from erosion.
Claims19
A substrate support pedestal, comprising:
- an electrostatic chuck body bonded to a cooling base via a bond layer;
- a porous plug;
- a gas flow passage formed between a top surface of the electrostatic chuck body and a bottom surface of the cooling base, the gas flow passage passing through a hole in the bond layer and the porous plug, the gas flow passage having a swept volume physically shielded from an inside edge of the hole in the bond layer;
- and
- a ring extending from a top surface of the cooling base and into the electrostatic chuck body.
A substrate support pedestal, comprising:
- an electrostatic chuck body bonded to a cooling base via a bond layer, wherein a cavity is formed in a bottom surface of the electrostatic chuck body;
- a porous plug;
- a sleeve disposed around the porous plug;
- a ring positioned on a top surface of the cooling base;
- and
- a gas flow passage formed between a top surface of the electrostatic chuck body and a bottom surface of the cooling base, the gas flow passage passing through a hole in the bond layer and the porous plug, the gas flow passage having a swept volume physically shielded from an inside edge of the hole in the bond layer by at least one of the sleeve or the ring.
Dependencies are inferred from the claim text.