Plasma-generating unit and substrate treatment apparatus including the same

A plasma generating unit, comprising:

• a high frequency power configured to generate a high frequency signal;
• an impedance matcher connected to an output terminal of the high frequency power;
• a first reactance device on a first segment between the impedance matcher and a first junction;
• a primary antenna on a first line, the first line being between the first junction and a first ground terminal;
• a second reactance device on a second segment, the second segment being between the first junction and a second junction;
• a secondary antenna on a second line, the second line being between the second junction and a second ground terminal;
• a variable reactance device on a third segment, the third segment being between the second junction and the secondary antenna, the variable reactance device being in series with the secondary antenna, the first reactance device and the second reactance device, the variable reactance device being the lone variable reactance device downstream of the impedance matcher relative to a normal flow of an electrical current through the plasma generating unit during an operational use of the plasma generating unit;
• and
• a third reactance device on a third line, the third line being between the second junction and a third ground terminal, the first reactance device, the second reactance device, the variable reactance device and the third reactance device being the lone reactance devices on the first segment, the second segment, the third segment and the third line, respectively.

A plasma generating unit, comprising:

• a high frequency power configured to generate a high frequency signal, the high frequency power being connected to a first node;
• a primary antenna and a secondary antenna in parallel connection with the first node;
• a first reactance device and a variable reactance device in series connection on a first segment, the first segment being between the first node and the antenna;
• and
• a second reactance device on a second segment, the second segment being connected to a second node on the first segment, the second node being between the variable reactance device and the first reactance device, the first reactance device and the variable reactance device being the lone reactance devices on the first segment, the second reactance device being the lone reactance device on the second segment, the variable reactance device being the lone variable reactance device downstream of the first node relative to a normal flow of an electrical current through the plasma generating unit during a normal operational use of the plasma generating unit.