Charged particle beam writing method and charged particle beam writing apparatus

A charged particle beam writing apparatus comprising:

• a shot division unit dividing a figure pattern using writing data into a plurality of shot figures in a size, each of which allows to be irradiated with a shot of a charged particle beam, the writing data defining the figure pattern;
• a correction processing unit virtually dividing a writing region of a writing target substrate into a mesh pattern which is a plurality of mesh regions, and calculating a correction irradiation amount to correct proximity effect and middle range effect for each of the plurality of mesh regions based on a position of the figure pattern, the middle range effect having an influence radius shorter than an influence radius of the proximity effect;
• an insufficient irradiation amount calculation unit calculating an irradiation amount for each of the plurality of shot figures using the correction irradiation amount, and calculating an insufficient irradiation amount at an edge portion of the shot figure based on the irradiation amount;
• a resizing processing unit resizing the shot figure based on the insufficient irradiation amount;
• and
• a writer writing the resized shot figure on the writing target substrate using a charged particle beam in the irradiation amount.