Modulation of rolling K vectors of angled gratings
AssigneeApplied Materials, Inc.
InventorsJoseph C. Olson, Morgan Evans, Rutger Meyer Timmerman Thijssen
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Abstract
Embodiments described herein relate to methods and apparatus for forming gratings having a plurality of fins with different slant angles on a substrate and forming fins with different slant angles on successive substrates using angled etch systems and/or an optical device. The methods include positioning portions of substrates retained on a platen in a path of an ion beam. The substrates have a grating material disposed thereon. The ion beam is configured to contact the grating material at an ion beam angle ϑ relative to a surface normal of the substrates and form gratings in the grating material.
Claims20
A grating forming method, comprising:
- projecting an ion beam toward a substrate at ion beam angle ϑ relative to a surface normal of the substrate, wherein:
- a first portion of a grating to be formed on the substrate is positioned at a first rotation angle ϕ1 between the ion beam and a first grating vector of one or more first fins to be formed by the ion beam contacting the first portion;
- the first rotation ϕ1 angle is selected to form the one or more first fins with a first slant angle ϑ′1;
- a second portion of the grating to be formed on the substrate is positioned at a second rotation angle ϕ2 between the ion beam and a second grating vector of one or more second fins to be formed by the ion beam contacting the second portion;
- and
- the second rotation angle ϕ2 is selected to form the one or more second fins of the grating with a second slant angle ϑ′2 different than the first slant angle ϑ′1.
A grating forming method, comprising:
- projecting an ion beam toward a substrate at ion beam angle ϑ relative to a surface normal of the substrate, a first portion of a grating to be formed on the substrate is positioned at a first rotation angle ϕ1 between the ion beam and a first grating vector of one or more first fins to be formed by the ion beam contacting the first portion, the first rotation ϕ1 angle is selected to form the one or more first fins with a first slant angle ϑ′1;
- rotating the substrate such that a second portion of the grating to be formed on the substrate is positioned at a second rotation angle ϕ2 between the ion beam and a second grating vector of one or more second fins to be formed by the ion beam contacting the second portion, the second rotation angle ϕ2 is selected to form the one or more second fins of the grating with a second slant angle ϑ′2 different than the first slant angle ϑ′1.
A grating forming method, comprising:
- positioning a first portion of a substrate retained on a platen in a path of an ion beam, the substrate having a grating material disposed thereon, the ion beam configured to contact the grating material at an ion beam angle ϑ relative to a surface normal of the substrate and form one or more first fins in the grating material;
- rotating the substrate retained on the platen about an axis of the platen resulting in a first rotation angle ϕ between the ion beam and a grating vector of the one or more first fins, the one or more first fins having a first slant angle ϑ′ relative to the surface normal of the substrate;
- positioning a second portion of the substrate in the path of the ion beam configured to form one or more second fins in the grating material;
- and
- rotating the substrate about the axis of the platen resulting in a second rotation angle ϕ between the ion beam and the grating vector of the one or more second fins, the one or more second fins having a second slant angle ϑ′ relative to the surface normal of the substrate.
Dependencies are inferred from the claim text.