Method for analyzing electromigration (EM) in integrated circuit
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChin-Shen Lin, Ming-Hsien Lin, Wan-Yu Lo, Meng-Xiang Lee
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Abstract
Methods for analyzing electromigration (EM) in an integrated circuit (IC) are provided. The layout of the IC is obtained. A metal segment is selected from the layout according to a current simulation result of the IC. EM rule is kept on the metal segment when a single via is formed over and in contact with the metal segment in the layout. The EM rule is relaxed on the metal segment when two first vias are formed over and in contact with the metal segment in the layout. The two first vias have the same current direction.
Claims20
A method for analyzing electromigration (EM) in an integrated circuit (IC), comprising:
- obtaining a layout of the IC;
- selecting a metal segment from the layout according to a current simulation result of the IC;
- keeping EM rule on the metal segment when a single via is formed over and in contact with the metal segment in the layout;
- and
- relaxing the EM rule on the metal segment when two first vias are formed over and in contact with the metal segment in the layout,
- wherein the two first vias have the same current direction.
A method for analyzing electromigration (EM) in an integrated circuit (IC), comprising:
- obtaining a layout of the IC;
- selecting a first via from the layout according to a current simulation result of the IC, wherein the first via is formed over and in contact with a metal segment in the layout;
- keeping EM rule on the first via when a single second via is formed over and in contact with the metal segment;
- and
- relaxing the EM rule on the first via when two second vias are formed over and in contact with the metal segment,
- wherein the first via and the two second vias have the same current direction.
A non-transitory computer-readable storage medium storing instructions that, when executed by a computer, cause the computer to perform a method for analyzing electromigration (EM) in an integrated circuit (IC), the method comprising:
- obtaining a layout of the IC;
- selecting a metal segment from the layout according to a current simulation result of the IC;
- keeping EM rule on the metal segment when a single via is formed over and in contact with the metal segment in the layout;
- and
- relaxing the EM rule on the metal segment when two first vias are formed over and in contact with the metal segment in the layout,
- wherein the two first vias have the same current direction.
Dependencies are inferred from the claim text.