Imprint apparatus, imprinting method, and manufacturing method of article
AssigneeCanon Kabushiki Kaisha
InventorHiroyuki Koide
Life of this patent
Estimating the term…
Loading patent…
AssigneeCanon Kabushiki Kaisha
InventorHiroyuki Koide
Estimating the term…
An imprint apparatus using a mold having a pattern region includes an irradiation unit that irradiates a substrate with irradiation light. The irradiation light has an intensity distribution over a region along a periphery of a shot area of the substrate and being capable of increasing viscosity of an imprint material or of solidifying the imprint material. The imprint apparatus also includes a control unit that sets an imprint condition for forming a pattern of the imprint material so as to reduce at least one of an extrusion of the imprint material from the shot area and an unfilling of the imprint material occurring in the shot area on the basis of results of detecting at least one of the extrusion and the unfilling of the imprint material obtained by detecting the pattern of the imprint material formed on the substrate.
An imprint apparatus for forming a pattern of an imprint material on a plurality of shot areas of a substrate by using a mold having a pattern region, the imprint apparatus comprising:
A method of adjusting condition for forming a pattern on an imprint material on a plurality of shot areas of a substrate by using a mold having a pattern region, the method comprising:
Dependencies are inferred from the claim text.