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AssigneeKLA Corporation
InventorsAlon Yagil, Yuval Lamhot, Ohad Bachar, Martin Mayo, Tal Yaziv, Roie Volkovich
Estimating the term…
A method and system for measuring misregistration between different layers of a semiconductor device, the method including providing a set of pupil inaccuracy scalable basis elements (PISBEs) relating to a plurality of patterned semiconductor device wafers (PSDWs), generating a single pupil image of a site on a PSDW, the PSDW being one of the plurality of PSDWs, by taking a single measurement of the site, the single pupil image including a plurality of site-specific pixels, calculating a set of site-specific pupil inaccuracy scalable basis element scaling factors (PISBESFs) for the single pupil image using the set of PISBEs and the plurality of site-specific pixels and calculating a site-specific misregistration value (SSMV) using the set of PISBEs and the set of site-specific PISBESFs.
A method of measuring misregistration between different layers of a semiconductor device, the method comprising:
A system for measuring misregistration between different layers of a semiconductor device, the system comprising:
A system for use with at least one scatterometry-based misregistration measurement tool (SMMT), said at least one SMMT being operative to measure at least one site on at least one reference patterned semiconductor device wafer (RPSDW) and at least one site on at least one patterned semiconductor device wafer (PSDW), the system comprising:
Dependencies are inferred from the claim text.