Aberration correction method and optical device
AssigneeHamamatsu Photonics K.K.
InventorNaoya Matsumoto
Life of this patent
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Abstract
A microscope apparatus includes SLMs each having a modulation plane, an objective lens disposed on an optical path between the modulation plane and an object, and a computer for controlling the SLMs on the basis of a modulation pattern including a correction pattern for correcting aberration caused by a refractive index interface of the object. The computer determines a position of the correction pattern in the modulation pattern on the basis of inclination information of the refractive index interface with respect to a plane perpendicular to an optical axis of the objective lens.
Claims16
An aberration correction method comprising:
- a coupling step of optically coupling a modulation plane of a spatial light modulator and an object through an objective lens;
- a control step of controlling the spatial light modulator on the basis of a modulation pattern including a correction pattern for correcting aberration caused by a refractive index interface of the object;
- and
- a measurement step of measuring an inclination angle of the refractive index interface of the object, wherein
- a position of the correction pattern in the modulation pattern is set on the basis of inclination information of the refractive index interface of the object with respect to a plane perpendicular to an optical axis of the objective lens such that a center of the correction pattern is deviated from a point where the optical axis of the objective lens intersects with the modulation plane by a distance determined on the basis of the inclination information, and
- the inclination information is determined on the basis of the inclination angle measured by the measurement step.
An aberration correction method comprising:
- a coupling step of optically coupling a modulation plane of a spatial light modulator and an object through an objective lens;
- a control step of controlling the spatial light modulator on the basis of a modulation pattern including a correction pattern for correcting aberration caused by a refractive index interface of the object;
- and
- a measurement step of measuring an inclination angle of the refractive index interface of the object, wherein
- the spatial light modulator and the objective lens are disposed on the basis of inclination information of the refractive index interface of the object with respect to a plane perpendicular to an optical axis of the objective lens such that the modulation plane is deviated relative to the optical axis of the objective lens in a direction intersecting with the optical axis by a distance determined on the basis of the inclination information, and
- the inclination information is determined on the basis of the inclination angle measured by the measurement step.
An optical apparatus comprising:
- a spatial light modulator having a modulation plane;
- an objective lens disposed on an optical path between the modulation plane and an object;
- a controller configured to control the spatial light modulator on the basis of a modulation pattern including a correction pattern for correcting aberration caused by a refractive index interface of the object;
- and
- a measurement unit configured to measure an inclination angle of the refractive index interface of the object, wherein
- a position of the correction pattern in the modulation pattern is set on the basis of inclination information of the refractive index interface of the object with respect to a plane perpendicular to an optical axis of the objective lens such that a center of the correction pattern is deviated from a point where the optical axis of the objective lens intersects with the modulation plane by a distance determined on the basis of the inclination information, and
- the inclination information is determined on the basis of the inclination angle measured by the measurement unit.
An optical apparatus comprising:
- a spatial light modulator having a modulation plane, and configured to modulate light on the basis of a modulation pattern including a correction pattern for correcting aberration caused by a refractive index interface of an object;
- an objective lens disposed on an optical path between the modulation plane and the object;
- a moving mechanism configured to move at least one of the objective lens and the spatial light modulator in a direction intersecting with an optical axis of the objective lens;
- a controller configured to control the moving mechanism;
- and
- a measurement unit configured to measure an inclination angle of the refractive index interface of the object, wherein
- the controller is configured to control the moving mechanism on the basis of inclination information of the refractive index interface of the object with respect to a plane perpendicular to the optical axis of the objective lens such that the modulation plane is deviated relative to the optical axis of the objective lens in a direction intersecting with the optical axis by a distance determined on the basis of the inclination information, and
- the inclination information is determined on the basis of the inclination angle measured by the measurement unit.
Dependencies are inferred from the claim text.