Method of measuring a flatness of an object and apparatus for performing the same
AssigneeSamsung Display Co., Ltd.
InventorYong Woon Lim
Life of this patent
Estimating the term…
Abstract
In a method of measuring a flatness of an object, a laser, which may have a wavelength reflectable from the object, may be converted into a laser array. The laser array may be irradiated to the object. The flatness of the object may be measured using a reflected laser array reflected from the object. Thus, the flatness of the object may be accurately measured to decrease process errors of a display device by correcting the flatness of the glass substrate.
Claims21
A method of measuring a flatness of an object, the method comprising:
- converting a laser, which has a wavelength reflectable from the object, into a laser array that includes multiple beams separated from one another;
- irradiating the laser array to the object, a direction of each beam of the laser array being substantially perpendicular to a surface of the object;
- and
- measuring the flatness of the object using a reflected laser array reflected from the object.
An apparatus for measuring a flatness of an object, the apparatus comprising:
- a laser source disposed over the object to generate a laser having a wavelength reflectable from the object;
- an etalon interferometer disposed between the object and the laser source to convert the laser into a laser array to be irradiated to the object, a direction of each beam of the laser array being substantially perpendicular to a surface of the object;
- and
- an analyzer disposed over the object to measure the flatness of the object using a reflected laser array reflected from the object.
An apparatus for measuring a flatness of a substrate, the apparatus comprising:
- a laser source disposed at a position different from a position of an object such that the laser source is disposed in a second vertical direction that is substantially parallel with a first vertical direction that passes through the substrate, the laser source generating a laser, which has a wavelength reflectable from the substrate, along the second vertical direction;
- an etalon interferometer disposed between the substrate and the laser source in the second vertical direction to convert the laser into a laser array;
- a beam splitter disposed between the etalon interferometer and the substrate to induce the laser array from the second vertical direction to the first vertical direction;
- and
- an analyzer disposed over the substrate in the first vertical direction to receive a reflected laser array reflected from the substrate and to measure the flatness of the substrate using the reflected laser array.
Dependencies are inferred from the claim text.