Vapor chamber and heat dissipation device with same

A heat dissipation device with a vapor chamber, the heat dissipation device being in thermal contact with a first heat source, wherein the vapor chamber comprises:

• a first plate and a second plate, wherein the first plate and the second plate are combined together, and an accommodation space is defined by the first plate and the second plate collaboratively, wherein the accommodation space includes a heat absorption zone and a condensation zone;
• a first capillary strip installed in the accommodation space and clamped between the first plate and the second plate, wherein the first capillary strip is extended from the heat absorption zone to the condensation zone, and the accommodation space is divided into at least one first region and at least one second region by the first capillary strip;
• a first communication structure formed in the first capillary strip, wherein the first communication structure is in communication with the first region and the second region;
• and
• a working medium accommodated within the accommodation space, wherein the working medium flows between the first region and the second region through the first communication structure,
• wherein the first heat source is in thermal contact with the vapor chamber and aligned with the heat absorption zone of the accommodation space, wherein the first capillary strip comprises a lower part and an upper part, the lower part of the first capillary strip is in contact with the first plate, and the upper part of the first capillary strip is in contact with the second plate, wherein the first communication structure comprises plural first notches, which are concavely formed in the upper part of the first capillary strip and extended to the lower part of the first capillary strip, wherein the plural first notches are in communication with the first region and the second region, wherein the plural first notches do not run through the lower part of the first capillary strip, so that the lower part of the first capillary strip is maintained as an integral structure, wherein the vapor chamber further comprises plural support posts, which are disposed within the accommodation space and clamped between the first plate and the second plate, wherein the plural support posts are not in contact with the first capillary strip, and the plural support posts are aligned with the first communication structure.