Atomic layer deposition apparatus and atomic layer deposition method

An atomic layer deposition apparatus comprising:

• a film-forming container in which a film-forming process is performed on a substrate;
• a vertically movable stage provided in the film-forming container;
• a susceptor held on the stage and being configured to hold the substrate;
• and
• a stage stopper configured to stop rising of the stage and, when in contact with the susceptor, partitioning a film-forming space in which the film-forming process is performed and a transporting space in which transport of the substrate is performed,
• wherein
• the susceptor comprises:
• an upper susceptor constituted by an upper susceptor substrate holding portion configured to hold the substrate and an upper susceptor peripheral portion arranged in a periphery of the upper susceptor substrate holding portion;
• and
• a lower susceptor configured to support the upper susceptor,
• a side surface of an outer peripheral portion of the upper susceptor peripheral portion second susceptor is positioned more inward than a substrate-side side surface of the stage stopper,
• a susceptor deposition prevention member is provided on and in contact with both an upper surface of the upper susceptor peripheral portion and an upper surface of the lower susceptor, and
• the susceptor deposition prevention member is arranged between the stage stopper and the upper susceptor substrate holding portion.