Metal mask substrate for vapor deposition, metal mask for vapor deposition, production method for metal mask substrate for vapor deposition, and production method for metal mask for vapor deposition
AssigneeToppan Printing Co., Ltd.
InventorsSumika Tamura, Mikio Shinno, Daisei Fujito, Kiyoaki Nishitsuji, Takehiro Nishi, Naoko Mikami
Life of this patent
Estimating the term…
Abstract
A vapor deposition metal mask substrate includes a nickel-containing metal sheet including a obverse surface and a reverse surface, which is opposite to the obverse surface. At least one of the obverse surface and the reverse surface is a target surface for placing a resist layer. The target surface has a surface roughness Sa of less than or equal to 0.019 μm. The target surface has a surface roughness Sz of less than or equal to 0.308 μm.
Claims9
A vapor deposition metal mask comprising a mask portion composed of a nickel-containing metal sheet, wherein
- the mask portion includes
- an obverse surface including an obverse surface opening, and
- a reverse surface including a reverse surface opening in communication with the obverse surface opening, the reverse surface being opposite to the obverse surface,
- at least one of the obverse surface or the reverse surface is a target surface,
- the target surface has a surface roughness Sa of less than or equal to 0.019 μm,
- the target surface has a surface roughness Sz of less than or equal to 0.308 μm,
- the nickel-containing metal sheet is made of invar, and has a thickness of between 2 μm and 40 μm inclusive, and
- a specular reflectance of incident light to the target surface is between 53.0% and 97.0%, inclusive.
Dependencies are inferred from the claim text.