Methods to pattern carbon nanotube sheets
AssigneeBoard of Regents, The University of Texas System
InventorsBehnoush Dousti, Gil Sik Lee, Negar Geramifard
Life of this patent
Estimating the term…
Abstract
Effective techniques for patterning carbon nanotube (CNT) sheets are disclosed herein. A carbon nanotube forest is grown on a catalyst-incorporated substrate, CNT sheets are drawn from the carbon nanotube forest, the CNT sheets are stacked on a substrate, followed by etching the CNT sheets by using a shadow mask through a controlled etch process. In some implementations, etching of the CNT sheets is carried out in a capacitively coupled plasma (CCP) etching system, where the CNT sheets are selectively exposed, in a controlled environment, to oxygen plasma via the shadow mask.
Claims20
A method to pattern carbon nanotubes, the method comprising:
- growing a spin-capable carbon nanotube forest on a catalyst-incorporated substrate;
- drawing one or more carbon nanotube sheets from the carbon nanotube forest;
- stacking the one or more carbon nanotube sheets on another substrate;
- and
- etching the one or more carbon nanotube sheets by selectively exposing the one or more carbon nanotube sheets to an oxygen plasma via a shadow mask, wherein the shadow mask comprises a metal.
A method to pattern carbon nanotubes, the method comprising:
- stacking one or more carbon nanotube sheets on a substrate;
- designing a shadow mask based on one or more structures to be patterned on the one or more carbon nanotube sheets, wherein the shadow mask comprises a metal;
- and
- employing the shadow mask in a capacitively coupled plasma (CCP) etching system to etch the one or more carbon nanotube sheets,
- wherein employing includes selectively exposing the one or more carbon nanotube sheets to oxygen plasma via the shadow mask, thereby etching the one or more structures on the one or more carbon nanotube sheets.
Dependencies are inferred from the claim text.