RF treatment apparatus, method of controlling RF treatment apparatus and skin treatment method using RF energy
AssigneeLutronic Corporation
InventorsKwang Chon Ko, Richard Howard Cohen
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AssigneeLutronic Corporation
InventorsKwang Chon Ko, Richard Howard Cohen
Estimating the term…
The present invention relates to an RF treatment apparatus controlling the RF energy so that the target tissue is maintained within a range of a treatment temperature if the target tissue is determined to have reached the treatment temperature based on the impedance, a method of controlling the RF treatment apparatus, and a skin treatment method using RF energy. The RF treatment apparatus, the method of controlling the RF treatment apparatus and the skin treatment method using RF energy according to the present invention have an effect in that they can improve the accuracy and efficiency of treatment because whether a target tissue corresponds to a treatment temperature is determined based on impedance of the tissue and the volume of the target tissue corresponding to the treatment temperature can be maximized while maintaining the target tissue to the treatment temperature for a predetermined time.
An RF treatment apparatus, comprising:
A method of controlling an RF treatment apparatus, comprising steps of:
A skin treatment method using RF energy, comprising steps of:
Dependencies are inferred from the claim text.