Plasma processing apparatus

An apparatus comprising:

• a plasma processing container;
• a workpiece placement table disposed in the plasma processing container;
• a dielectric plate having a facing surface that faces the workpiece placement table;
• an antenna provided on a surface of the dielectric plate opposite to the facing surface and configured to introduce an induced electric field for plasma excitation into the plasma processing container via the dielectric plate, the antenna including a planar spiral antenna having spiral portions divided into a first segment and a second segment;
• an electromagnet group including a plurality of electromagnets disposed along an outer circumference of the plasma processing container and configured to form a magnetic field in the plasma processing container;
• and
• a controller configured to control magnitudes of electric currents flowing through respective electromagnets of the electromagnet group differently from each other, to generate a magnetic gradient along a circumferential direction in the magnetic field that exists only in an outer circumferential space in the plasma processing container,
• wherein:
• a first space of the plasma processing container corresponding to the first segment has a greater number of spiral portions of the planar spiral antenna than a second space of the plasma processing container corresponding to the second segment,
• the controller is configured to generate the magnetic gradient along the circumferential direction in the magnetic field such that a magnetic field strength in the second space is larger than a magnetic field strength in the first space, and
• the first space is adjacent to the second space in the circumferential direction.