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US 11,448,964 B2Granted
Coating compositions for use with an overcoated photoresist
AssigneeRohm and Haas Electronic Materials Korea Ltd.
InventorsJung-June Lee, Jae-Bong Lim, Jun-Han Yun, Ji-Hoon Kang
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Abstract
Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that comprise a thermal acid generator that comprises: i) a pyridinium component having one or more ring substituents selected from optionally substituted alkyl and optionally substituted heteroalkyl; and ii) a sulfonic acid component.
Claims17
A coated substrate comprising:
- a substrate having thereon:
- a) a composition comprising:
- 1) a resin;
- and
- 2) an ionic thermal acid generator that comprises:
- i) a pyridinium component having one or more ring substituents selected from optionally substituted alkyl and optionally substituted heteroalkyl;
- and
- ii) a sulfonic acid component;
- b) a layer of a photoresist composition above the a) composition.
6 more elements
Dependencies are inferred from the claim text.