Resist composition and method of forming resist pattern
AssigneeTokyo Ohka Kog Yo Co., Ltd.
InventorsMasatoshi Arai, Takaya Maehashi, Koshi Onishi
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AssigneeTokyo Ohka Kog Yo Co., Ltd.
InventorsMasatoshi Arai, Takaya Maehashi, Koshi Onishi
Estimating the term…
A resist composition including a base component and an acid generator component, the base component including a resin component having a structural unit (a0) represented by general formula (a0) shown below, and the acid generator component containing at least one of a compound (b-1), a compound (b-2) and a compound (b-3) represented by general formula (b-3) shown below in which Wa represents a divalent aromatic hydrocarbon group; Ra00 represents an acid dissociable group; R101, R104 and R106 each independently represents a hydrocarbon group containing an aromatic ring; R105, R107 and R108 each independently represents a cyclic group, a chain alkyl group which may have a substituent or a chain alkenyl group; R102 represents a fluorine atom or a fluorinated alkyl group of 1 to 5 carbon atoms and M′m+ represents an m-valent onium cation.
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition comprising:
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition comprising:
Dependencies are inferred from the claim text.