US 11,448,960 B2Granted

Salts and photoresists comprising same

AssigneeRohm and Haas Electronic Materials LLC

InventorsEmad Aqad, James F. Cameron, James W. Thackeray

Life of this patent

Estimating the term…

New Te-salts are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography.

Dependent claims

A photoresist composition comprising

a resin;
and
a photoacid generator that comprises a salt comprising an anion component that comprises one or more Te atoms,
wherein the photoresist composition can be imaged with activating radiation and developed with alkaline aqueous developer.

1 more element

Dependencies are inferred from the claim text.

G03F 7/0042
Photosensitive materials: with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
C07F 11/00
Compounds containing elements of groups 6 or 16 of the periodic table
G03F 7/0045
Photosensitive materials: with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
G03F 7/027
Photosensitive materials: non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

From the US filing history. Foreign family members aren’t listed.

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