EUV mask
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChing-Huang Chen, Chi-Yuan Sun, Hua-Tai Lin, Hsin-Chang Lee, Ming-Wei Chen
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Abstract
A reflective mask includes a substrate, a reflective multilayer disposed on the substrate, a capping layer disposed on the reflective multilayer, a photo catalytic layer disposed on the capping layer, and an absorber layer disposed on the photo catalytic layer and carrying circuit patterns having openings. Part of the photo catalytic layer is exposed at the openings of the absorber layer, and the photo catalytic layer includes one selected from the group consisting of titanium oxide (TiO2), tin oxide (SnO), zinc oxide (ZnO) and cadmium sulfide (CdS).
Claims20
A reflective mask, comprising:
- a substrate;
- a reflective multilayer disposed on the substrate;
- a capping layer disposed on the reflective multilayer;
- a photo catalytic layer disposed on the capping layer;
- and
- an absorber layer disposed on the photo catalytic layer and carrying circuit patterns having openings, wherein:
- a part of the photo catalytic layer is exposed at the openings of the absorber layer, and a part of the photo catalytic layer is disposed between the capping layer and absorber layer, and
- the photo catalytic layer includes one selected from the group consisting of titanium oxide (TiO2), tin oxide (SnO), zinc oxide (ZnO) and cadmium sulfide (CdS).
A reflective mask, comprising:
- a substrate;
- a reflective multilayer disposed on the substrate;
- an absorber layer disposed over the reflective multilayer and carrying circuit patterns having openings;
- a photo catalytic layer disposed over the absorber layer and over the reflective multilayer at the openings of the absorber layer;
- and
- a buffer layer between the photo catalytic layer and the absorber layer,
- wherein the photo catalytic layer includes one selected from the group consisting of titanium oxide (TiO2), tin oxide (SnO), zinc oxide (ZnO) and cadmium sulfide (CdS).
A reflective mask, comprising:
- a substrate;
- a reflective multilayer disposed on the substrate;
- a photo catalytic layer disposed directly on the reflective multilayer;
- and
- an absorber layer disposed on the photo catalytic layer and carrying circuit patterns, wherein:
- part of the photo catalytic layer is exposed at opening of the absorber layer, and
- the photo catalytic layer includes one selected from the group consisting of tin oxide (SnO), zinc oxide (ZnO) and cadmium sulfide (CdS).
Dependencies are inferred from the claim text.