Coating of 3-dimensional substrates
AssigneePicosun Oy
InventorsMarko Pudas, Riina Ritasalo
Life of this patent
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Abstract
A substrate processing apparatus, including a reaction chamber, at least one coating material inlet to the reaction chamber, a movable substrate support to support 3D substrates to be coated, and an actuator configured to move the substrate support to change the orientation of said 3D substrates during substrate processing. A method for coating 3D substrates, the method including providing 3D substrates within a reaction chamber on a substrate support, feeding at least one coating material into the reaction chamber, and changing the orientation of said 3D substrates during substrate processing by actuating a movement of the substrate support.
Claims13
A substrate processing apparatus, comprising:
- a reaction chamber;
- at least one coating material inlet to the reaction chamber;
- a movable substrate support to support a 3D substrate or a plurality of 3D substrates to be coated;
- and
- an actuator configured to move the substrate support to change the orientation of said 3D substrate or a plurality of 3D substrates during substrate processing.
A method for coating one or more 3D substrates, the method comprising:
- providing at least one 3D substrate within a reaction chamber on a substrate support;
- feeding at least one coating material into the reaction chamber;
- and
- changing the orientation of said at least one 3D substrate during substrate processing by actuating a movement of the substrate support.
Dependencies are inferred from the claim text.