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US 11,447,866 B2Granted
High temperature chemical vapor deposition lid
AssigneeApplied Materials, Inc.
InventorsMuhannad Mustafa, Muhammad M. Rasheed, Mario D. Sanchez, Srinivas Gandikota, Wei V. Tang
Life of this patent
Estimating the term…
Abstract
Process chamber lids, processing chambers and methods using the lids are described. The lid includes a pumping liner with a showerhead, blocker plate and gas funnel positioned therein. A liner heater is positioned on the pumping liner to control temperature in the pumping liner. Gas is flowed into the gas funnel using a dead-volume free one-way valve with a remote plasma source.
Claims20
A process chamber lid comprising:
- a pumping liner comprising a body having an inner wall, an outer wall, a top wall and a bottom wall, the body having a lower portion and an upper portion, the inner wall extending around a central axis spaced a first distance from the central axis forming an open central region;
- a showerhead positioned within the lower portion of the pumping liner in the open central region, the showerhead having a front surface and a back surface defining a thickness with a plurality of apertures extending through the thickness;
- a blocker plate positioned within the lower portion of the pumping liner in the open central region, the blocker plate having a front surface and a back surface defining a thickness with a plurality of apertures extending through the thickness, the front surface spaced a blocker distance from the back surface of the showerhead;
- a gas funnel positioned within the open central region of the pumping liner, the gas funnel having a front surface, a back surface, an outer wall and an inner walls, the front surface spaced a funnel distance from the back surface of the blocker plate to form a funnel gap, the gas funnel having an opening extending through the back surface to the front surface;
- and
- a liner heater positioned on the top wall of the pumping liner, the liner heater comprising a plurality of independently controlled separate segments spaced around the top wall of the pumping liner, each segment is separated from adjacent segments by an eye bolt connected to the pumping liner.
3 more elements
A process chamber lid comprising:
- a pumping liner comprising a body having an inner wall, an outer wall, a top wall and a bottom wall, the body having a lower portion and an upper portion, the inner wall extending around a central axis spaced a first distance from the central axis forming an open central region, the pumping liner comprises an outer top wall and an inner top wall, the inner top wall forming an inner ledge having a ledge surface connecting the inner top wall and the outer top wall;
- a showerhead positioned within the lower portion of the pumping liner in the open central region, the showerhead having a front surface and a back surface defining a thickness with a plurality of apertures extending through the thickness;
- a blocker plate positioned within the lower portion of the pumping liner in the open central region, the blocker plate having a front surface and a back surface defining a thickness with a plurality of apertures extending through the thickness, the front surface spaced a blocker distance from the back surface of the showerhead;
- a gas funnel positioned within the open central region of the pumping liner, the gas funnel having a front surface, a back surface, an outer wall and an inner walls, the front surface spaced a funnel distance from the back surface of the blocker plate to form a funnel gap, the gas funnel having an opening extending through the back surface to the front surface, the outer wall of the gas funnel having a lower outer wall and an upper outer wall, the upper outer wall being further from the central axis than the lower outer wall, the lower outer wall and upper outer wall connected by a cantilever surface;
- and a liner heater positioned on the top wall of the pumping liner.
2 more elements
Dependencies are inferred from the claim text.