# US 11,443,940 B2 · Apparatus for uniform light intensity and methods of using the same

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- Number: US 11,443,940 B2
- Document ID: US11443940B2
- Status: Granted
- Kind: B2
- Application number: 16/910,586
- Filed: 2020-06-24
- Published: 2021-12-30
- Granted: 2022-09-13
- Earliest claimed: 2020-06-24
- Assignees: Canon Kabushiki Kaisha
- Applicants: Canon Kabushiki Kaisha
- Inventors: Nilabh K. Roy; Mario Johannes Meissl; Masaki Saito
- Web page: https://patentgrep.com/patent/US11443940B2

## CPC

- H10P 14/6538: {by exposure to UV light}
- H10P 95/08: {Planarisation of organic insulating materials}
- H10P 14/6342: {Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating}
- H10P 72/0436: {mainly by radiation}
- H10P 72/0604: {Process monitoring, e.g. flow or thickness monitoring}
- H10P 72/53: {using optical controlling means}
- H10P 72/7611: {characterised by edge profile or support profile}
- H10P 72/7614: {characterised by a plurality of individual support members, e.g. support posts or protrusions}
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

A system and method of forming a planarization layer on a substrate is disclosed. The method can include holding a superstrate with a superstrate chuck, the superstrate chuck positioned relative to a diffusing element, where the diffusing element includes a pattern and the superstrate chuck includes one or more geometric features, and where the pattern of the diffusing element aligns with the one or more geometric features of the superstrate chuck. The method can also include dispensing a formable material over the substrate, contacting the formable material over the substrate with a superstrate, providing a set of beams that pass through the diffusing element to cure the formable material over the substrate and form a layer over the substrate while the superstrate is contacting the formable material.

## Claims

### Claim 1

A system for planarizing a substrate, comprising:
a substrate chuck to hold the substrate, wherein the substrate is configured to hold a formable material thereon;
a superstrate chuck to hold a superstrate, wherein the superstrate chuck comprises one or more geometric features; and
a diffusing element, wherein the diffusing element comprises a pattern aligned and corresponding with the one or more geometric features of the superstrate chuck, wherein the diffusing element is configured to allow actinic radiation beams to pass through to cure the formable material to form a layer and planarize the layer on the substrate;
wherein the diffusing element comprises a first portion and a second portion, and wherein collimated light exiting the first portion exits as collimated beams and collimated light exiting the second portion exits as diffused beams; and
wherein the first portion has a surface roughness that is less than a surface roughness of the second portion.

### Claim 2 (depends on 1)

The system of claim 1, wherein the system further comprises a radiation source to provide the actinic radiation beams to the substrate through the diffusing element, the superstrate chuck, and a held superstrate, wherein the diffusing element is between the radiation source and the superstrate chuck.

### Claim 3 (depends on 1)

The system of claim 1, wherein the diffusing element has a first surface and a second surface opposite the first surface, and wherein the pattern of the diffusing element is on the first surface of the diffusing element.

### Claim 4 (depends on 1)

The system of claim 1, wherein the second portion comprises the pattern.

### Claim 5 (depends on 1)

The system of claim 1, further comprising a camera and a lighting system to align the superstrate with the substrate.

### Claim 6 (depends on 1)

The system of claim 1, wherein the diffusing element is integrated with the superstrate chuck.

### Claim 7 (depends on 5)

The system of claim 5, wherein the diffusing element is between the camera and lighting system, and the superstrate chuck.

### Claim 8 (depends on 1)

The system of claim 1, wherein the second portion of the diffusing element has a surface roughness of between 0.1 μm to μm Ra.

### Claim 9 (depends on 3)

The system of claim 3, wherein the pattern of the diffusing element comprises between 0.1% and 30% of a total surface area of the first surface of the diffusing element.

### Claim 10 (depends on 9)

The system of claim 9, wherein the pattern is localized to cover over only the one or more geometric features of the superstrate chuck.

### Claim 11 (depends on 9)

The system of claim 9, wherein the pattern extends circumferentially towards a center of the diffusing element.

### Claim 12 (depends on 11)

The system of claim 11, wherein the pattern comprises one or more areas on the diffusing element.

### Claim 13 (depends on 12)

The system of claim 12, wherein the diffusing element is integral with the superstrate chuck.