# US 11,442,370 B2 · Reticle retaining system

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- Number: US 11,442,370 B2
- Document ID: US11442370B2
- Status: Granted
- Kind: B2
- Application number: 16/798,456
- Filed: 2020-02-24
- Published: 2021-04-22
- Granted: 2022-09-13
- Earliest claimed: 2019-10-16
- Assignees: Gudeng Precision Industrial Co., Ltd.
- Applicants: Gudeng Precision Industrial Co., Ltd
- Inventors: Chia-Ho Chuang; Hsing-Min Wen; Hsin-Min Hsueh; Yi-Hsuan Lee; Ming-Chien Chiu
- Web page: https://patentgrep.com/patent/US11442370B2

## CPC

- G03F 7/70741: {Handling masks outside exposure position, e.g. reticle libraries}
- H10P 72/1926: {characterised by the presence of atmosphere modifying elements inside or attached to the closed carrier}
- G03F 1/66: Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
- G03F 7/7075: {Handling workpieces outside exposure position, e.g. SMIF box}
- H10P 72/1902: {specially adapted for a single substrate}
- H10P 72/1906: {specially adapted for containing masks, reticles or pellicles}
- H10P 72/1916: {characterised by sealing arrangements}
- H10P 72/1922: {characterised by the construction of the closed carrier}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

A reticle retaining system including an inner pod and an outer pod is described. The inner pod includes an inner base configured to receive a workpiece; an inner cover configured to couple to the inner base, thereby forming an interior for housing the workpiece; and a hold down pin movably arranged through the inner cover and configured to press the workpiece. The outer pod includes an outer base configured to receive the inner base, an outer cover configured to couple to the outer base, and a pushing element arranged on the outer cover. The hold down pin, the outer cover and the pushing element have a charge dissipation property. When the pushing element pushes the hold down pin to press the workpiece, a charge dissipation path is established from the received workpiece, through the hold down pin and the pushing element, to the outer cover.

## Claims

### Claim 1

A reticle retaining system, comprising:
an inner base configured to receive a reticle;
an inner cover configured to couple the inner base, thereby forming an interior for housing the reticle;
a hold down pin, including a pressing part arranged through the inner cover and configured to press the reticle, a pressure receiving part opposite to the pressing part, and a shoulder part wider than the pressure receiving part;
a limiting cap, arranged on the inner cover and configured to limit a motion of the hold down pin, wherein the limiting cap defines a window so that the pressure receiving part extends therein; and
a first elastic element arranged between the limiting cap and the shoulder part of the hold down pin.

### Claim 2 (depends on 1)

The system according to claim 1, wherein the system further comprises a second elastic element arranged between the shoulder part and the inner cover.

### Claim 3 (depends on 1)

The system according to claim 1, wherein the first elastic element has an annular structure surrounding the pressure receiving part of the hold down pin.

### Claim 4 (depends on 1)

The system according to claim 1, further comprising an outer pod, the outer pod comprising:
an outer base configured to receive the inner base;
an outer cover configured to couple to the outer base; and
a pushing element arranged on the outer cover and configured to push the hold down pin to press the reticle when the outer cover is coupled to the outer base;
wherein a top surface of the limiting cap and an upper surface of the pressure receiving part are substantially coplanar when the outer cover is coupled to the outer base.

### Claim 5 (depends on 4)

The system according to claim 4, wherein:
the hold down pin, the outer cover, and the pushing element have a charge dissipation property; and
when the pushing element pushes the hold down pin to press the reticle, a charge dissipation path is established from the reticle, through the hold down pin and the pushing element, to the outer cover.

### Claim 6 (depends on 4)

The system according to claim 4, wherein:
the system further comprises a supporting element arranged on the inner base and configured to support the reticle;
the outer pod further comprises a supporting structure arranged on the outer base and configured to support the inner base;
the supporting structure and the supporting element have a charge dissipation property; and
when the outer cover is coupled to the outer base, the supporting element touches the reticle and establishes a charge dissipation path from the reticle, through the inner base and the supporting structure, to the outer base.

### Claim 7

A reticle retaining system, comprising:
an inner pod, comprising:
an inner base configured to receive a reticle;
an inner cover configured to couple to the inner base thereby forming an interior for housing the reticle;
a hold down pin having a charge dissipation property, the hold down pin including
a pressing part arranged through the inner cover, and configured to press the reticle; and
a pressure receiving surface arranged opposite to the pressing part; and
a limiting cap arranged on the inner cover and configured to limit a motion of the hold down pin, wherein the limiting cap defines a window that exposes the pressure receiving surface; and
an outer pod, comprising:
an outer base configured to receive the inner base;
an outer cover configured to couple the outer base; and
a pushing element configured to push the hold down pin at an exposed portion thereof so that the hold down pin presses the reticle; and
wherein a width of a projected area of the exposed portion of the pressure receiving surface is smaller than that of the pushing element.

### Claim 8 (depends on 7)

The system according to claim 7, wherein:
the limiting cap has a limiting surface facing the pushing element;
the pushing element is further configured to physically contact the limiting cap; and
the limiting surface and the exposed portion of the pressure receiving surface are substantially coplanar when the pushing element physically contacts the limiting surface.

### Claim 9 (depends on 7)

The system according to claim 7, wherein the hold down pin further comprises:
a pressure receiving part arranged through the window of the limiting cap, wherein the pressure receiving part defines the pressure receiving surface; and
a shoulder part arranged between the pressure receiving part and the pressing part, wherein the shoulder part is wider than the pressure receiving part.

### Claim 10 (depends on 7)

The system according to claim 7, wherein:
the limiting cap has a limiting surface facing the pushing element;
the pushing element is further configured to physically contact the limiting cap; and
one of the pressure receiving surface of the hold down pin and the limiting surface is closer to the reticle than the other of the hold down pin and the limiting surface when the pushing element physically contacts the limiting surface.

### Claim 11 (depends on 10)

The system according to claim 10,
wherein the pushing element has a curved protrusion configured to extend into the window defined by the limiting cap when the pushing element physically contacts the limiting surface.

### Claim 12

A retaining system, comprising:
an inner pod, comprising:
an inner base configured to receive a workpiece;
an inner cover configured to couple to the inner base, thereby forming an interior for housing the workpiece; and
a hold down pin movably arranged through the inner cover and configured to press the workpiece; and
an outer pod, comprising:
an outer base configured to receive the inner base;
an outer cover configured to couple to the outer base; and
a pushing element arranged on the outer cover;
wherein the hold down pin, the outer cover and the pushing element have a charge dissipation property, and
when the outer cover is coupled to the outer base, the pushing element pushes the hold down pin to press the workpiece and establishes a charge dissipation path from the workpiece, through the hold down pin and the pushing element, to the outer cover.

### Claim 13 (depends on 12)

The system according to claim 12,
wherein the inner pod further comprises a supporting element arranged on the inner base and configured to support the workpiece;
wherein the outer pod further comprises a supporting structure arranged on the outer base and configured to support the inner base; and
wherein the supporting structure, the supporting element, and the outer base have the charge dissipation property;
wherein when the outer cover is coupled to the outer base, the supporting element touches the workpiece and establishes a charge dissipation path from the workpiece, through the inner base and the supporting structure, to the outer base.

### Claim 14 (depends on 13)

The system according to claim 13,
wherein the supporting element, the hold down pin, and the pushing element have a surface resistance value in a range from about 106 to 1011Ω.

### Claim 15 (depends on 13)

The system according to claim 13,
wherein the supporting element, the hold down pin, and the pushing element have a surface resistance value less than about 105Ω.

### Claim 16 (depends on 13)

The system according to claim 13, wherein:
the inner base defines a first curved interface surface at a bottom surface thereof; and
the supporting structure has a second curved interface surface substantially matching the first curved interface surface.

### Claim 17 (depends on 12)

The system according to claim 12, wherein:
the hold down pin has a pressure receiving surface facing the pushing element;
the inner pod further comprises a limiting cap arranged on the inner cover and configured to limit a motion of the hold down pin, wherein the limiting cap defines a window that exposes a portion of the pressure receiving surface of the hold down pin; and
a projected area of the exposed portion of the pressure receiving surface is smaller than that of the pushing element.

### Claim 18 (depends on 17)

The system according to claim 17, wherein:
the limiting cap has a limiting surface facing the pushing element; and
the pushing element is further configured to physically contact the limiting surface of the limiting cap when the outer cover is coupled to the outer base.

### Claim 19 (depends on 18)

The system according to claim 18,
wherein the limiting surface and the exposed portion of the pressure receiving surface are substantially coplanar when the pushing element physically contacts the limiting surface.

### Claim 20 (depends on 17)

The system according to claim 17, further comprising an elastic element arranged to physically contact the limiting cap and the hold down pin.