# US 11,442,319 B2 · Display substrate, display apparatus, and method of fabricating display substrate > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 11,442,319 B2 - Document ID: US11442319B2 - Status: Granted - Kind: B2 - Application number: 16/071,691 - Filed: 2018-02-02 - Published: 2021-07-01 - Granted: 2022-09-13 - Earliest claimed: 2017-06-02 - Assignees: Boe Technology Group Co., Ltd. - Applicants: Boe Technology Group Co., Ltd. - Inventors: Feng Zhang; Zhijun Lv; Wenqu Liu; Liwen Dong; Shizheng Zhang; Ning Dang - Web page: https://patentgrep.com/patent/US11442319B2 ## CPC - G02F 1/133345: {Insulating layers (G02F1/1335, G02F1/1337, G02F1/135, G02F1/136 take precedence)} - G02F 1/13394: {spacers regularly patterned on the cell subtrate, e.g. walls, pillars (G02F1/133377 takes precedence)} - G02F 1/134309: {characterised by their geometrical arrangement} - G02F 1/13439: {characterised by their electrical, optical, physical properties; materials therefor; method of making} - H10K 59/1201: {Manufacture or treatment} - H10K 59/122: Pixel-defining structures or layers, e.g. banks - H10K 59/353: {characterised by the geometrical arrangement of the RGB subpixels} - H10K 59/8051: {Anodes} - H10K 2102/351: {Thickness} - Y02E 10/549: Organic PV cells - G02F: OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS - H10K: ORGANIC ELECTRIC SOLID-STATE DEVICES - Y02E: REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION ## Abstract The present application discloses display substrate having a base substrate; an insulating layer on the base substrate; and an electrode layer on a side of the insulating layer distal to the base substrate and having a plurality of electrode blocks. The insulating layer has a first side distal to the base substrate and a second side opposite to the first side and proximal to the base substrate. Each of the plurality of electrode blocks has a third side distal to the base substrate and a fourth side opposite to the third side and proximal to the base substrate. The first side of the insulating layer in the inter-electrode block region has a first height relative to a surface of the base substrate greater than a second height of the fourth side of an adjacent electrode of the plurality of electrode blocks relative to the surface of the base substrate. ## Claims ### Claim 1 A display substrate, comprising: a base substrate; an insulating layer on the base substrate; and an electrode layer on a side of the insulating layer distal to the base substrate and comprising a plurality of electrode blocks; wherein the display substrate has an electrode block region corresponding to the plurality of electrode blocks, and an inter-electrode block region outside the electrode block region; the insulating layer has a first side distal to the base substrate and a second side opposite to the first side and proximal to the base substrate; each of the plurality of electrode blocks has a third side distal to the base substrate and a fourth side opposite to the third side and proximal to the base substrate; the first side of the insulating layer in the inter-electrode block region has a first height relative to a surface of the base substrate greater than a second height of the fourth side of an adjacent electrode of the plurality of electrode blocks relative to the surface of the base substrate; the insulating layer comprises a protrusion in the inter-electrode block region; the display substrate further comprises a pixel definition layer on a side of the protrusion distal to the base substrate, and limited in an inter-subpixel region; the pixel definition layer is in direct contact with a top surface of the protrusion, in direct contact with the plurality of electrode blocks, and in direct contact with and covers an entirety of a lateral side surface of the protrusion; a lowest point of the lateral side surface of the protrusion and a bottom surface of a respective electrode block of the plurality of electrode blocks have a same height relative to the surface of the base substrate; and an orthographic projection of the pixel definition layer on the base substrate covers an orthographic projection of the protrusion on the base substrate. ### Claim 2 (depends on 1) The display substrate of claim 1, wherein the first side of the insulating layer in the electrode block region has a third height relative to the surface of the base substrate smaller than or substantially same as the second height of the fourth side of the adjacent electrode of the plurality of electrode blocks relative to the surface of the base substrate. ### Claim 3 (depends on 1) The display substrate of claim 1, wherein the insulating layer further comprises a recess in the electrode block region; and orthographic projections of the plurality of electrode blocks on the base substrate are substantially non-overlapping with an orthographic projection of the protrusion. ### Claim 4 (depends on 1) The display substrate of claim 1, wherein the first side of the insulating layer in the electrode block region is in direct contact with the fourth side of the adjacent electrode of the plurality of electrode blocks. ### Claim 5 (depends on 1) The display substrate of claim 1, wherein the first height is greater than the second height by approximately 1 μm to approximately 3 μm. ### Claim 6 (depends on 2) The display substrate of claim 2, wherein the first height is greater than the third height by approximately 1 μm to approximately 3 μm. ### Claim 7 (depends on 1) The display substrate of claim 1, wherein the display substrate has a plurality of subpixel regions; each of the plurality of electrode blocks is in one of the plurality of subpixel regions; and the inter-electrode block region is the inter-subpixel region. ### Claim 8 (depends on 1) The display substrate of claim 1, wherein the display substrate is a light emitting diode display substrate comprising a plurality of light emitting diodes; the plurality of electrode blocks are a plurality of anodes for driving light emission in the plurality of light emitting diodes; and the insulating layer is a planarization layer. ### Claim 9 (depends on 1) The display substrate of claim 1, further comprising a spacer layer on a side of the protrusion distal to the insulating layer; wherein the spacer layer is limited in the inter-subpixel region; an orthographic projection of the pixel definition layer on the base substrate covers an orthographic projection of the spacer layer on the base substrate; and an orthographic projection of the protrusion on the base substrate covers the orthographic projection of the spacer layer on the base substrate. ### Claim 10 (depends on 1) The display substrate of claim 1, wherein the display substrate is a liquid crystal display substrate; the plurality of electrode blocks are a plurality of pixel electrodes for driving light emission in a plurality of subpixel regions; and the insulating layer is a passivation layer. ### Claim 11 (depends on 1) The display substrate of claim 1, wherein the display substrate is a liquid crystal display substrate; and the plurality of electrode blocks are a plurality of common electrodes. ### Claim 12 (depends on 1) The display substrate of claim 1, wherein the insulating layer in the inter-electrode block region and the electrode block region is an integral insulating layer extending substantially throughout the display substrate. ### Claim 13 (depends on 1) The display substrate of claim 1, wherein the first height of the first side of the insulating layer in the inter-electrode block region relative to a surface of the base substrate is greater than a fourth height of the third side of the adjacent electrode of the plurality of electrode blocks relative to the surface of the base substrate. ### Claim 14 (depends on 1) The display substrate of claim 1, wherein the insulating layer in the inter-electrode block region and the electrode block region is an integral insulating layer extending substantially throughout the display substrate; the first height of the first side of the insulating layer in the inter-electrode block region relative to a surface of the base substrate is greater than a fourth height of the third side of the adjacent electrode of the plurality of electrode blocks relative to the surface of the base substrate; and the first side of the insulating layer in the electrode block region has a third height relative to the surface of the base substrate smaller than or substantially same as the second height of the fourth side of the adjacent electrode of the plurality of electrode blocks relative to the surface of the base substrate. ### Claim 15 (depends on 1) A display apparatus, comprising the display substrate of claim 1. ### Claim 16 (depends on 1) The display substrate of claim 1, wherein the insulating layer has a first thickness in a region having the protrusion and a second thickness in a region without the protrusion; and the first thickness is greater than the second thickness. ### Claim 17 A method of fabricating a display substrate, comprising: forming an insulating layer on a base substrate; and subsequent to forming the insulating layer, forming an electrode layer on a side of the insulating layer distal to the base substrate, the electrode layer formed to comprises a plurality of electrode blocks; wherein the display substrate is formed to have an electrode block region corresponding to the plurality of electrode blocks, and an inter-electrode block region outside the electrode block region; the insulating layer is formed to have a first side distal to the base substrate and a second side opposite to the first side and proximal to the base substrate; each of the plurality of electrode blocks is formed to have a third side distal to the base substrate and a fourth side opposite to the third side and proximal to the base substrate; the insulating layer and the electrode layer are formed so that the first side of the insulating layer in the inter-electrode block region has a first height relative to a surface of the base substrate greater than a second height of the fourth side of an adjacent electrode of the plurality of electrode blocks relative to the surface of the base substrate; the insulating layer is formed to comprise a protrusion in the inter-electrode block region; the method further comprises forming a pixel definition layer on a side of the protrusion distal to the base substrate, and limited in an inter-subpixel region; the pixel definition layer is formed to be in direct contact with a top surface of the protrusion, in direct contact with the plurality of electrode blocks, and in direct contact with and covers an entirety of a lateral side surface of the protrusion; a lowest point of the lateral side surface of the protrusion and a bottom surface of a respective electrode block of the plurality of electrode blocks have a same height relative to the surface of the base substrate; and an orthographic projection of the pixel definition layer on the base substrate covers an orthographic projection of the protrusion on the base substrate. ### Claim 18 (depends on 17) The method of claim 17, wherein the insulating layer and the electrode layer are formed so that the first side of the insulating layer in the electrode block region has a third height relative to the surface of the base substrate smaller than or substantially same as the second height of the fourth side of the adjacent electrode of the plurality of electrode blocks relative to the surface of the base substrate. ### Claim 19 (depends on 17) The method of claim 17, wherein the insulating layer is formed so that an orthographic projection of the insulating layer on the base substrate is substantially non-overlapping with orthographic projections of the plurality of electrode blocks on the base substrate. ### Claim 20 (depends on 18) The method of claim 18, wherein forming the insulating layer comprises: forming an insulating material layer on the base substrate; and patterning the insulating material layer using a half-tone mask plate or a gray-tone mask plate thereby forming the insulating layer and a plurality of vias extending through the insulating layer; wherein the insulating layer is formed to have a first part in the inter-electrode block region and a second part in the electrode block region.