# US 11,442,297 B2 · Perovskite oxides with a-axis orientation

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- Number: US 11,442,297 B2
- Document ID: US11442297B2
- Status: Granted
- Kind: B2
- Application number: 16/712,732
- Filed: 2019-12-12
- Published: 2020-06-25
- Granted: 2022-09-13
- Earliest claimed: 2018-12-20
- Assignees: Imec Vzw
- Applicants: Imec Vzw
- Inventors: Clement Merckling
- Web page: https://patentgrep.com/patent/US11442297B2

## CPC

- G02F 1/03: based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect (G02F1/061 takes precedence)
- C23C 14/083: {of refractory metals or yttrium}
- C23C 14/28: by wave energy or particle radiation (C23C14/32 - C23C14/48 take precedence)
- C30B 23/025: {characterised by the substrate}
- C30B 29/32: Titanates; Germanates; Molybdates; Tungstates
- H10N 30/079: using intermediate layers, e.g. for growth control
- H10N 30/708: {Intermediate layers, e.g. barrier, adhesion or growth control buffer layers}
- H10N 30/8536: {Alkaline earth metal based oxides, e.g. barium titanates}
- G02F: OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- C30B: SINGLE-CRYSTAL GROWTH (by using ultra-high pressure, e.g. for the formation of diamonds, B01J3/06); UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL (zone-refining of metals or alloys C22B); PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE (casting of metals, casting of other substances by the same processes or devices B22D; working of plastics B29; modifying the physical structure of metals or alloys C21D, C22F); SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE (for producing semiconductor devices or parts thereof H10); APPARATUS THEREFOR
- H10N: ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR

## Abstract

A structure is provided and includes (i) a substrate having a surface, the surface comprising a ternary or quaternary oxide having a first lattice parameter, the first lattice parameter being a lattice parameter of the ternary or quaternary oxide as it is present at the surface; and (ii) a layer of a perovskite oxide on the ternary or quaternary oxide, the perovskite oxide having a second lattice parameter, the second lattice parameter being a native lattice parameter of the perovskite oxide, wherein the first lattice parameter is larger than the second lattice parameter. A method for forming a perovskite oxide with an a-axis orientation is also provided.

## Claims

### Claim 1

A structure comprising:
(i) a layer of a monocrystalline ternary or quaternary oxide on a Si(001) substrate or a Ge(001) substrate, the layer having a surface, the surface comprising a monocrystalline ternary or quaternary oxide having a crystalline unit cell having two perpendicular dimensions parallel to the surface and equal to a first lattice parameter, the first lattice parameter being a lattice parameter of the monocrystalline ternary or quaternary oxide as it is present at the surface; and
(ii) a tensile strained layer of a monocrystalline perovskite oxide on the ternary or quaternary oxide, the monocrystalline perovskite oxide having in its tensile strained state a tetragonal crystalline unit cell characterized by lattice parameters a and c, wherein a refers to the dimension of the unit cell parallel to the top surface of the layer, wherein c refers to the dimension of the unit cell out of the plane of the top surface of the layer, wherein c is smaller than a, thereby giving an a-axis orientation to the tensile strained layer, and being selected from perovskite oxides having an in-plane second lattice parameter, being a native lattice parameter, and being smaller than the first lattice parameter.

### Claim 2 (depends on 1)

The structure according to claim 1, wherein the first lattice parameter is from 0.05% to 3% larger than the second lattice parameter.

### Claim 3 (depends on 1)

The structure according to claim 1, wherein the first lattice parameter is from 0.1% to 1.5% larger than the second lattice parameter.

### Claim 4 (depends on 1)

The structure according to claim 1, wherein the ternary oxide has a general chemical formula ABO3 wherein A is selected from the group consisting of Ba, Sr, and Ca, and B is selected from the group consisting of Ti, Zr, and Hf.

### Claim 5 (depends on 1)

The structure according to claim 1, wherein the quaternary oxide has a general chemical formula ABxB′1-xO3 wherein 0<x<1, A is selected from the group consisting of Ba, Sr, and Ca, B is selected from the group consisting of Ti, Zr, and Hf, and B′ is selected from the group consisting of Ti, Zr, and Hf and differs from B.

### Claim 6 (depends on 5)

The structure according to claim 5, wherein x is selected in such a way that the first lattice parameter is larger than the second lattice parameter.

### Claim 7 (depends on 1)

The structure according to claim 1, wherein the perovskite oxide is selected from the group consisting of BaTiO3, PbZryTi1-yO wherein 0≤y≤1, and an alloy of BaTiO3 or PbZryTi1-yO and (K,Na,Li)(Ta,Nb)O3.

### Claim 8 (depends on 1)

The structure according to claim 1, wherein the semiconductor substrate is the Si(001) substrate, the quaternary oxide is SrHfxTi1-xO3 with 0.53≤x≤0.7 and the perovskite oxide is BaTiO3.

### Claim 9 (depends on 1)

The structure according to claim 1, wherein the semiconductor substrate is the Ge(001) substrate, the ternary oxide is BaZrO3 and the perovskite oxide is BaTiO3.

### Claim 10 (depends on 1)

The structure according to claim 1, wherein the layer of perovskite oxide has a thickness ranging between 1 nm and 50 nm.

### Claim 11 (depends on 1)

The structure according to claim 1, wherein the layer of perovskite oxide has a thickness ranging between 2 nm and 20 nm.

### Claim 12

A method for forming a tensile strained monocrystalline perovskite oxide layer having in its tensile strained state a tetragonal crystalline unit cell having lattice parameters a and c, wherein a refers to the dimension of the unit cell parallel to the top surface of the layer, wherein c refers to the dimension of the unit cell out of the plane of the top surface of the layer, wherein c is smaller than a thereby giving an a-axis orientation to the tensile strained perovskite oxide layer, the method comprising:
(a) providing a layer of a monocrystalline ternary or quaternary oxide on a Si(001) substrate or a Ge(001) substrate, the layer having a surface, the surface comprising a monocrystalline ternary or quaternary oxide having a crystalline unit cell having two perpendicular dimensions parallel to the surface and equal to a first lattice parameter, the first lattice parameter being a lattice parameter of the ternary or quaternary oxide as it is present at the surface; and
(b) depositing a layer of a perovskite oxide on the ternary or quaternary oxide, the perovskite oxide being selected from perovskite oxides having an in-plane second lattice parameter, being a native lattice parameter, and being smaller than the first lattice parameter.

### Claim 13 (depends on 12)

The method according to claim 12, wherein step (b) of depositing the layer of perovskite oxide is performed by molecular beam epitaxy or pulsed laser deposition.

### Claim 14 (depends on 12)

The method according to claim 12, wherein step (a) comprises depositing a layer of the ternary or quaternary oxide on a semiconductor substrate by molecular beam epitaxy.

### Claim 15 (depends on 14)

The method according to claim 14, wherein depositing the layer of the ternary or quaternary oxide on the semiconductor substrate comprises depositing the layer of ternary or quaternary oxide on a 2×1 reconstructed surface of the Si(001) or Ge(001) substrate.
