# US 11,442,207 B2 · System and method for forming diffracted optical element having varied gratings > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 11,442,207 B2 - Document ID: US11442207B2 - Status: Granted - Kind: B2 - Application number: 16/778,631 - Filed: 2020-01-31 - Published: 2020-05-28 - Granted: 2022-09-13 - Earliest claimed: 2018-01-09 - Assignees: Varian Semiconductor Equipment Associates, Inc. - Applicants: Varian Semiconductor Equipment Associates, Inc. - Inventors: Morgan Evans; Rutger Meyer Timmerman Thijssen; Joseph Olson; Peter Kurunczi; Robert Masci - Web page: https://patentgrep.com/patent/US11442207B2 ## CPC - G02B 5/1828: {having means for producing variable diffraction (controlling the direction of light by means of one or more diffracting elements G02B26/0808; acousto-optical elements G02F1/11, G02F1/33; electro- or magneto-optical diffraction G02F1/292, G02F1/2955)} - G02B 5/1814: {structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings (G02B5/189 takes precedence)} - G02B 5/1819: {Plural gratings positioned on the same surface, e.g. array of gratings (plural diffractive elements positioned sequentially along the optical path G02B27/4272)} - G02B 5/1857: {using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams} - G11B 7/1353: Diffractive elements, e.g. holograms or gratings {(diffraction gratings per se G02B5/18; holograms per se G02B5/32; grating systems G02B27/44)} - G11B 7/1372: Lenses - H01J 37/30: Electron-beam or ion-beam tubes for localised treatment of objects - G02B 27/0081: {with means for altering, e.g. enlarging, the entrance or exit pupil} - G03F 7/0005: {Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor} - G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS - G11B: INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER (recording measured values in a way that does not require playback through a transducer G01D9/00; recording or playback apparatus using mechanically marked tape, e.g. punched paper tape, or using unit records, e.g. punched or magnetically marked cards G06K; transferring data from one type of record carrier to another G06K1/18; circuits for coupling output of reproducer to radio receiver H04B1/20; gramophone pick-ups or like acoustic electromechanical transducers or circuits therefor H04R) - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract Embodiments herein provide systems and methods for forming an optical component. A method may include providing a plurality of proximity masks between a plasma source and a workpiece, the workpiece including a plurality of substrates secured thereto. Each of the plurality of substrates may include first and second target areas. The method may further include delivering, from the plasma source, an angled ion beam towards the workpiece, wherein the angled ion beam is then received at one of the plurality of masks. A first proximity mask may include a first set of openings permitting the angled ion beam to pass therethrough to just the first target area of each of the plurality of substrates. A second proximity mask may include a second set of openings permitting the angled ion beam to pass therethrough just to the second target area of each of the plurality of substrates. ## Claims ### Claim 1 A system for generating angled gratings, the system comprising: a plasma source delivering an angled ion beam to a workpiece; a plurality of substrates coupled to the workpiece, each of the plurality of substrates including a first angled grating and a second angled grating; and a plurality of proximity masks positionable between the plasma source and the workpiece, wherein a first proximity mask of the plurality of proximity masks includes a first set of openings permitting the angled ion beam to pass therethrough to form the first angled grating of each of the plurality of substrates, and wherein a second proximity mask of the plurality of proximity masks includes a second set of openings permitting the angled ion beam to pass therethrough to form the second angled grating of each of the plurality of substrates. ### Claim 2 (depends on 1) The system of claim 1, wherein each of the plurality of substrates further includes a third angled grating, and wherein a third proximity mask of the plurality of proximity masks includes a third set of openings permitting the angled ion beam to pass therethrough to form the third angled grating of each of the plurality of substrates. ### Claim 3 (depends on 2) The system of claim 2, wherein each opening of the first set of openings is a first size, wherein each opening of the second set of openings is a second size, and wherein each opening of the third set of openings is a third size. ### Claim 4 (depends on 2) The system of claim 2, wherein the ion beam impacts just one proximity mask of the plurality of proximity masks at a time. ### Claim 5 (depends on 2) The system of claim 2, wherein the first angled grating includes a first plurality of fins forming a first angle relative to a base surface of each of the plurality of substrates, wherein the second angled grating includes a second plurality of fins forming a second angle relative to the base surface of each of the plurality of substrates, and wherein the third angled grating includes a third plurality of fins forming a third angle relative to the base surface of each of the plurality of substrates. ### Claim 6 (depends on 5) The system of claim 5, wherein the first angle, the second angle, and the third angle are different from one another. ### Claim 7 (depends on 1) The system of claim 1, wherein each of the plurality of substrates is a backlit substrate. ### Claim 8 An assembly, comprising: a first proximity mask positionable between a plasma source and a workpiece, wherein the first proximity mask includes a first set of openings permitting an angled ion beam to pass therethrough to form a first angled grating of each of a plurality of substrates on the workpiece; and a second proximity mask positionable between the plasma source and the workpiece, wherein the second proximity mask includes a second set of openings permitting the angled ion beam to pass therethrough to form a second angled grating of each of the plurality of substrates. ### Claim 9 (depends on 8) The assembly of claim 8, wherein each of the plurality of substrates further includes a third angled grating, and wherein a third proximity mask includes a third set of openings permitting the angled ion beam to pass therethrough to form the third angled grating of each of the plurality of substrates. ### Claim 10 (depends on 9) The assembly of claim 9, wherein each opening of the first set of openings is a first size, wherein each opening of the second set of openings is a second size, and wherein each opening of the third set of openings is a third size. ### Claim 11 (depends on 9) The assembly of claim 9, wherein the ion beam impacts just one proximity mask of the plurality of proximity masks at a time. ### Claim 12 (depends on 9) The assembly of claim 9, wherein the first angled grating includes a first plurality of fins forming a first angle relative to a base surface of each of the plurality of substrates, wherein the second angled grating includes a second plurality of fins forming a second angle relative to the base surface of each of the plurality of substrates, and wherein the third angled grating includes a third plurality of fins forming a third angle relative to the base surface of each of the plurality of substrates. ### Claim 13 (depends on 12) The assembly of claim 12, wherein the first angle, the second angle, and the third angle are different from one another. ### Claim 14 A system, comprising: a workpiece including a plurality of substrates, each of the plurality of substrates including a first angled grating and a second angled grating; and a plurality of proximity masks operable to partially intercept an angled ion beam delivered towards the workpiece, wherein a first proximity mask of the plurality of proximity masks includes a first set of openings permitting the angled ion beam to pass therethrough to form the first angled grating of each of the plurality of substrates, and wherein a second proximity mask of the plurality of proximity masks includes a second set of openings permitting the angled ion beam to pass therethrough to form the second angled grating of each of the plurality of substrates. ### Claim 15 (depends on 14) The system of claim 14, wherein each of the plurality of substrates further includes a third angled grating, and wherein a third proximity mask of the plurality of proximity masks includes a third set of openings permitting the angled ion beam to pass therethrough to form the third angled grating of each of the plurality of substrates. ### Claim 16 (depends on 15) The system of claim 15, wherein each opening of the first set of openings is a first size, wherein each opening of the second set of openings is a second size, and wherein each opening of the third set of openings is a third size. ### Claim 17 (depends on 15) The system of claim 15, wherein the angled ion beam impacts just one proximity mask of the plurality of proximity masks at a time. ### Claim 18 (depends on 15) The system of claim 15, wherein the first angled grating includes a first plurality of fins forming a first angle relative to a base surface of each of the plurality of substrates, wherein the second angled grating includes a second plurality of fins forming a second angle relative to the base surface of each of the plurality of substrates, and wherein the third angled grating includes a third plurality of fins forming a third angle relative to the base surface of each of the plurality of substrates. ### Claim 19 (depends on 18) The system of claim 18, wherein the first angle, the second angle, and the third angle are different from one another.