# US 11,442,200 B2 · Low-reflection coated glass sheet, method for producing low-reflection coated substrate, and coating liquid for forming low-reflection coating of low-reflection coated substrate

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- Number: US 11,442,200 B2
- Document ID: US11442200B2
- Status: Granted
- Kind: B2
- Application number: 16/320,901
- Filed: 2017-07-07
- Published: 2019-05-30
- Granted: 2022-09-13
- Earliest claimed: 2016-07-28
- Assignees: Nippon Sheet Glass Co., Ltd.
- Applicants: Nippon Sheet Glass Company, Limited
- Inventors: Mizuho Koyo; Tatsuhiro Nakazawa; Mitsuhiro Kawazu
- Web page: https://patentgrep.com/patent/US11442200B2

## CPC

- C03C 17/009: {Mixtures of organic and inorganic materials, e.g. ormosils and ormocers}
- G02B 1/11: Anti-reflection coatings
- B01J 37/0215: {Coating}
- B05D 3/00: Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials (successively applying liquids or other fluent materials B05D1/36; drying ovens F26B)
- B05D 3/02: by baking {(B05D3/04 takes precedence)}
- B05D 5/06: to obtain multicolour or other optical effects (B05D5/02 takes precedence)
- B05D 7/24: for applying particular liquids or other fluent materials
- C03C 17/006: {with materials of composite character}
- C03C 17/25: by deposition from the liquid phase
- C09D 5/00: Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced {(electrically insulating plastics, resins or waxes H01B3/30)}; Filling pastes
- C09D 5/006: {Anti-reflective coatings}
- C09D 7/61: inorganic
- C09D 7/67: {Particle size smaller than 100 nm}
- C09D 7/68: {Particle size between 100-1000 nm}
- C09D 183/00: Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D 183/02: Polysilicates
- C09D 201/00: Coating compositions based on unspecified macromolecular compounds
- G02B 1/111: using layers comprising organic materials
- G02B 1/113: using inorganic layer materials only
- B05D 1/28: performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
- B05D 3/0272: {with ovens}
- B05D 3/0413: {Heating with air}
- B05D 2203/35: Glass
- B05D 2401/10: Organic solvent (B05D2401/21 takes precedence)
- B05D 2518/10: Silicon-containing polymers
- B05D 2601/22: Silica
- B05D 2601/24: Titanium dioxide, e.g. rutile
- C03C 2217/23: Mixtures
- C03C 2217/475: Inorganic materials
- C03C 2217/71: Photocatalytic coatings
- C03C 2218/113: by sol-gel processes
- C03C 2218/36: Underside coating of a glass sheet
- C08K 3/36: Silica
- C08K 2003/2241: {Titanium dioxide}
- C03C: CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- B01J: CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B05D: PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL (conveying articles or workpieces through baths of liquid B65G, e.g. B65G49/02)
- C09D: COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR (cosmetics A61K; processes for applying liquids or other fluent materials to surfaces, in general, B05D; staining wood B27K5/02; glazes or vitreous enamels C03C; natural resins, French polish, drying-oils, driers, turpentine, per se, C09F; polishing compositions other than French polish, ski waxes C09G; adhesives or use of materials as adhesives C09J; materials for sealing or packing joints or covers C09K3/10; materials for stopping leaks C09K3/12; processes for the electrolytic or electrophoretic production of coatings C25D)
- C08K: Use of inorganic or non-macromolecular organic substances as compounding ingredients (paints, inks, varnishes, dyes, polishes, adhesives C09)

## Abstract

A low-reflection coated glass sheet of the present invention includes a glass sheet and a low-reflection coating. The low-reflection coating is formed on at least a portion of one principal surface of the glass sheet and contains a binder containing silica as a main component, fine silica particles bound by the binder, and fine titania particles bound by the binder. The low-reflection coating satisfies the following relationships: 30 mass %<CSP<68 mass %; 12 mass %≤CTP<50 mass %; 20 mass %<CBinder<43.75 mass %; CTP/CBinder≥0.6; CBinder<25 mass % in the case of CSP≥55 mass %; and CTP>20 mass % in the case of CSP<55 mass %. The low-reflection coated glass sheet has a transmittance gain of 2.0% or more.

## Claims

### Claim 1

A low-reflection coated glass sheet comprising:
a glass sheet; and
a low-reflection coating formed on at least a portion of one principal surface of the glass sheet, the low-reflection coating comprising a binder containing silica as a main component, fine silica particles bound by the binder, and fine titania particles bound by the binder, wherein
the low-reflection coating satisfies the following relationships when the content of the fine silica particles in the low-reflection coating, the content of the fine titania particles in the low-reflection coating, and the content of the silica of the binder in the low-reflection coating are defined as CSP mass %, CTP mass %, and CBinder mass %, respectively:
30 mass %<CSP<68 mass %;
12 mass %≤CTP<50 mass %;
20 mass %<CBinder<43.75 mass %;
CTP/CBinder≥0.6;
CBinder<25 mass % in the case of CSP≥55 mass %; and
CTP>20 mass % in the case of CSP<55 mass %, and
the low-reflection coated glass sheet has a transmittance gain of 2.0% or more, the transmittance gain being determined by subtracting an average light transmittance of the glass sheet unprovided with the low-reflection coating in the wavelength range of 380 nm to 850 nm from an average light transmittance of the low-reflection coated glass sheet in the wavelength range of 380 nm to 850 nm.

### Claim 2 (depends on 1)

The low-reflection coated glass sheet according to claim 1, wherein the low-reflection coating further satisfies the relationship CTP/CBinder>0.8.

### Claim 3 (depends on 1)

The low-reflection coated glass sheet according to claim 1, wherein the low-reflection coating further satisfies the following relationships:
30 mass %<CSP≤65 mass %;
15 mass %≤CTP≤40 mass %; and
20 mass %<CBinder≤30 mass %.

### Claim 4 (depends on 1)

The low-reflection coated glass sheet according to claim 1, wherein the low-reflection coating further satisfies the following relationships:
35 mass %≤CSP≤60 mass %;
15 mass %≤CTP≤40 mass %; and
20 mass %<CBinder<25 mass %.

### Claim 5 (depends on 1)

The low-reflection coated glass sheet according to claim 1, wherein a critical contact angle of water on the low-reflection coating, as defined in Japanese Industrial Standard (JIS) R 1703-1:2007, is 5° or less.

### Claim 6 (depends on 1)

The low-reflection coated glass sheet according to claim 1, wherein when, according to JIS R 1703-1:2007, oleic acid is applied to the low-reflection coating and subsequently the low-reflection coating is irradiated with ultraviolet light at an intensity of 1.0 mW/cm2, a period of time from start of the ultraviolet irradiation to a point at which a contact angle of water on the low-reflection coating reaches 5° is 40 hours or less.

### Claim 7 (depends on 1)

A method for producing a low-reflection coated glass sheet according to claim 1,
the method comprising: forming a coating film by applying a coating liquid to the glass sheet; and forming the low-reflection coating by drying and curing the coating film, wherein a maximum temperature reached by a surface of the glass sheet during the drying and curing of the coating film is 120° C. or higher and 350° C. or lower.

### Claim 8 (depends on 7)

The method according to claim 7, wherein in the drying and curing of the coating film, a period of time during which the surface of the glass sheet has a temperature of 200° C. or higher is 5 minutes or less.

### Claim 9 (depends on 7)

The method according to claim 7, wherein in the drying and curing of the coating film, a period of time during which the surface of the glass sheet has a temperature of 120° C. or higher is 3 minutes or less.

### Claim 10 (depends on 7)

The method according to claim 7, wherein
the coating liquid comprises fine silica particles, fine titania particles, a source material for the binder, and a solvent,
the source material for the binder comprises a silicon alkoxide, and
the solvent comprises an organic solvent as a main component, the organic solvent being miscible with water and having a boiling point of 150° C. or lower.

### Claim 11 (depends on 1)

A coating liquid for forming a low-reflection coating of a low-reflection coated glass sheet according to claim 1,
the low-reflection coating being formed on at least a portion of one principal surface of the glass sheet, the low-reflection coating including a binder containing silica as a main component, fine silica particles bound by the binder, and fine titania particles bound by the binder, wherein
the coating liquid comprising fine silica particles, fine titania particles, a source material for the binder, and a solvent, wherein
the source material for the binder comprises a silicon alkoxide, and
the solvent comprises an organic solvent as a main component, the organic solvent being miscible with water and having a boiling point of 150° C. or lower.

### Claim 12 (depends on 11)

The coating liquid according to claim 11, further comprising an acid having an acid dissociation constant pKa of 2.5 or less as a hydrolysis catalyst for hydrolysis of the silicon alkoxide.