Milling a multi-layered object
OwnerYehuda Zurinventor
Life of this patent
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Abstract
A miller, a non-transitory computer readable medium, and a method for milling a multi-layered object. The method may include (i) receiving or determining milling parameters related to a milling process, the milling parameters may include at least two out of (a) a defocus strength, (b) a duration of the milling process, (c) a bias voltage supplied to an objective lens during the milling process, (d) an ion beam energy, and (e) an ion beam current density, and (ii) forming a crater by applying the milling process while maintaining the milling parameters, wherein the applying of the milling process includes directing a defocused ion beam on the multi-layered object.
Claims20
A method for milling a multi-layered object, the method comprises:
- receiving or determining milling parameters related to a milling process;
- wherein the milling parameters comprise at least two out of (a) a defocus strength, (b) a duration of the milling process, (c) a bias voltage supplied to an objective lens during the milling process, (d) an ion beam energy, and (e) an ion beam current density;
- and
- forming a crater in the multi-layered object by applying the milling process while maintaining the milling parameters, wherein the applying of the milling process comprises directing a defocused ion beam onto the multi-layered object.
A miller that comprises a controller and a focused ion beam column;
- wherein the controller is configured to receive or determine milling parameters related to a milling process;
- wherein the milling parameters comprise at least two out of (a) a defocus strength, (b) a duration of the milling process, (c) a bias voltage supplied to an objective lens during the milling process, (d) an ion beam energy, and (e) an ion beam current density;
- and
- wherein the focused ion beam column configured to form a crater in a multi-layered object by applying the milling process while maintaining the milling parameters, wherein the applying of the milling process comprises directing a defocused ion beam on a multi-layered object.
A non-transitory computer readable medium that stores instructions for:
- receiving or determining milling parameters related to a milling process;
- wherein the milling parameters comprise at least two out of (a) a defocus strength, (b) a duration of the milling process, (c) a bias voltage supplied to an objective lens during the milling process, (d) an ion beam energy, and (e) an ion beam current density;
- and
- forming a crater by applying the milling process while maintaining the milling parameters, wherein the applying of the milling process comprises directing a defocused ion beam on a multi-layered object.
Dependencies are inferred from the claim text.