# US 11,440,102 B2 · Coated cutting tool and method

> Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt

- Number: US 11,440,102 B2
- Document ID: US11440102B2
- Status: Granted
- Kind: B2
- Application number: 16/063,825
- Filed: 2016-12-20
- Published: 2020-09-10
- Granted: 2022-09-13
- Earliest claimed: 2015-12-22
- Assignees: Sandvik Intellectual Property AB
- Applicants: Sandvik Intellectual Property AB
- Inventors: Lars Johnson
- Web page: https://patentgrep.com/patent/US11440102B2

## CPC

- B23B 27/14: Cutting tools of which the bits or tips {or cutting inserts} are of special material
- C23C 30/005: {on hard metal substrates}
- C23C 14/0641: {Nitrides (C23C14/0617 takes precedence)}
- C23C 14/0664: {Carbonitrides}
- C23C 14/08: Oxides (C23C14/10 takes precedence)
- C23C 14/185: {by cathodic sputtering}
- C23C 14/325: {Electric arc evaporation}
- C23C 28/044: {coatings specially adapted for cutting tools or wear applications}
- B23B: TURNING; BORING (arrangements for copying or controlling B23Q)
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)

## Abstract

A coated cutting tool includes a substrate and a coating, wherein the coating has a PVD layer being a compound of the formula Ti1-xSixCaNbOc, wherein 0.10<x≤0.30, 0≤a≤0.75, 0.25≤b≤1, 0≤c≤0.2, and a+b+c=1. The PVD layer is a NaCl structure solid solution. The disclosure further relates to a method for producing the PVD layer by cathodic arc evaporation using a pulsed bias voltage of from about −40 to about −450 V to the substrate and using a duty cycle of less than about 12% and a pulsed bias frequency of less than about 10 kHz.

## Claims

### Claim 1

A coated cutting tool comprising a substrate and a coating, wherein the coating includes a PVD layer being a compound of the formula Ti1-xSixCaNbOc, wherein 0.10<x≤0.30, 0≤a≤0.75, 0.25≤b≤1, 0≤c≤0.2, and a+b+c=1, wherein the PVD layer is a NaCl structure solid solution and wherein the PVD layer has a FWHM (Full Width at Half Maximum) value for the cubic (111) peak in X-ray diffraction being ≤0.35 degrees (2theta).

### Claim 2 (depends on 1)

The coated cutting tool according to claim 1, wherein in the formula Ti1-xSixCaNbOc, 0.12≤x≤0.25.

### Claim 3 (depends on 1)

The coated cutting tool according to claim 1, wherein the FWHM value for the cubic (111) peak in X-ray diffraction is ≤0.25 degrees (2theta).

### Claim 4 (depends on 1)

The coated cutting tool according to claim 1, wherein the PVD layer has a residual stress being >−3 GPa.

### Claim 5 (depends on 1)

The coated cutting tool according to claim 1, wherein the PVD layer includes faceted crystal grains on its surface.

### Claim 6 (depends on 1)

The coated cutting tool according to claim 1, wherein a thickness of the PVD layer is from about 0.5 to about 20 μm.

### Claim 7 (depends on 1)

The coated cutting tool according to claim 1, wherein the PVD layer is an arc evaporation deposited layer.

### Claim 8

A method for producing a coating on a substrate, the coating including a PVD layer deposited by cathodic arc evaporation, the PVD layer being a compound of the formula Ti1-xSixCaNbOc, wherein 0.10<x≤0.30, 0≤a≤0.75, 0.25≤b≤1, 0≤c≤0.2, and a+b+c=1, and wherein the PVD layer is a NaCl structure solid solution and wherein the PVD layer has a FWHM (Full Width at Half Maximum) value for the cubic (111) peak in X-ray diffraction being ≤0.35 degrees (2theta), the PVD layer being deposited by applying a pulsed bias voltage of from about −40 to about −450 V to the substrate and using a duty cycle of less than about 12% and a pulsed bias frequency of less than about 10 kHz.

### Claim 9 (depends on 8)

The method according to claim 8, wherein the duty cycle is from about 2 to about 10%.

### Claim 10 (depends on 8)

The method according to claim 8, wherein the pulsed bias frequency is from about 0.1 to about 8 kHz.

### Claim 11 (depends on 8)

The method according to claim 8, wherein the pulsed bias voltage is from about −50 to about −350 V.