Back to results
US 11,424,592 B2Granted
Siloxane mitigation for laser systems
AssigneePanasonic Intellectual Property Management Co., Ltd.
InventorsBryan Lochman, Wang-Long Zhou, Francisco Villarreal-Saucedo, Bien Chann
Life of this patent
Estimating the term…
Abstract
In various embodiments, the concentration and deposition of siloxane materials within components of laser systems, such as laser resonators, is reduced or minimized utilizing mitigation systems that may also supply gas having low siloxane levels into multiple different components in series or in parallel.
Claims26
A laser apparatus comprising:
- an enclosed laser cavity comprising one or more beam emitters therewithin;
- a gas inlet for permitting ingress of gas into the laser cavity;
- a pump for supplying gas to the gas inlet;
- and
- a siloxane-mitigation system configured to remove siloxanes from gas supplied to the gas inlet by the pump,
- wherein the laser cavity is configured to allow leakage of the supplied gas therefrom into a surrounding ambient without a dedicated gas outlet.
3 more elements
Dependencies are inferred from the claim text.