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US 11,422,465 B2Granted
Extreme ultraviolet photoresist with high-efficiency electron transfer
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsWei-Han Lai, Chin-Hsiang Lin, Chien-Wei Wang
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Abstract
A method includes forming a photoresist layer over a substrate, wherein the photoresist layer includes a polymer, a sensitizer, and a photo-acid generator (PAG), wherein the sensitizer includes a resonance ring that includes nitrogen and at least one double bond. The method further includes performing an exposing process to the photoresist layer. The method further includes developing the photoresist layer, thereby forming a patterned photoresist layer.
Claims20
A method comprising:
- forming a photoresist layer over a substrate, wherein the photoresist layer includes a polymer responsive to an acid, a sensitizer, and a photo-acid generator (PAG) bonded to the sensitizer, wherein the sensitizer includes an imidazole ring and a hydroxy, wherein the hydroxy is attached to a carbon atom in the imidazole ring, wherein the carbon atom is directly bonded to a nitrogen atom in the imidazole ring, wherein the PAG includes a sulfonium cation or an iodonium cation, wherein the PAG further includes a heterocyclic ring directly bonded to the sulfonium cation or the iodonium cation, and wherein the heterocyclic ring includes one nitrogen atom and less than six carbon atoms;
- performing an exposing process to the photoresist layer;
- performing a thermal treatment to the photoresist layer;
- and
- developing the photoresist layer, thereby forming a patterned photoresist layer.
2 more elements
A method comprising:
- forming a photoresist layer over a substrate, wherein the photoresist layer includes a polymer having an acid labile group, a sensitizer, and a photo-acid generator (PAG) bonded to the sensitizer, wherein the PAG comprises a sulfonium cation and three heterocyclic rings directly bonded to the sulfonium cation, wherein the sensitizer includes benzimidazole and a hydroxyl group bonded thereto, and wherein the hydroxyl group is bonded to a carbon atom adjacent to a nitrogen atom in the benzimidazole;
- performing an exposing process to the photoresist layer;
- and
- developing the photoresist layer, thereby forming a patterned photoresist layer.
1 more element
A method comprising:
- forming a photoresist layer over a substrate, wherein the photoresist layer includes:
- a polymer having an acid-labile group;
- a sensitizer, wherein the sensitizer includes a structure selected from (A) and (B);
- a photo-acid generator (PAG) bonded to the sensitizer, wherein the PAG includes a structure selected from (C)-(J)
- performing an exposing process to the photoresist layer;
- and
- developing the photoresist layer, thereby forming a patterned photoresist layer.
4 more elements
Dependencies are inferred from the claim text.