Polymer composition for stereolithography
AssigneeSumitomo Rubber Industries, Ltd.
InventorsMutsuki Sugimoto, Takuro Akasaka
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Abstract
An object of the present invention is to provide a novel polymer composition for stereolithography that is capable of suitably providing an elastic molded product by stereolithography. A polymer composition for stereolithography containing a liquid polymer and a monomer, the polymer composition for stereolithography having a viscosity of 3,000 mPa·s or less, the viscosity being measured in an environment of a temperature of 25° C. and a relative humidity of 50% using an E-type viscometer under conditions of a cone plate diameter φ of 25 mm and a shear rate of 100 sec−1.
Claims14
A polymer composition for stereolithography comprising:
- a liquid polymer;
- a monomer;
- and
- at least two photopolymerization initiators different in absorption band;
- wherein the polymer composition for stereolithography has a viscosity of 3,000 mPa·s or less, the viscosity being measured in an environment of a temperature of 25° C. and a relative humidity of 50% using an E-type viscometer under conditions of a cone plate diameter φ of 25 mm and a shear rate of 100 sec−1, and
- wherein the liquid polymer includes at least one of a liquid isoprene having a (meth)acryloyl group and a liquid isobutylene having a (meth)acryloyl group.
Dependencies are inferred from the claim text.