Method of manufacturing a charged particle detector

A charged particle detector, comprising:

• a sensor device having a sensitive layer and a passivation layer, the sensitive layer having a first surface which faces the passivation layer and a second surface that is opposite the first surface;
• a mechanical supporting layer connected to said sensor device in such a way that the passivation layer is situated in between said sensitive layer and said mechanical supporting layer, wherein the mechanical supporting layer is provided so that the first surface of the sensitive layer faces the mechanical supporting layer;
• and
• wherein the charged particle detector is formed at least in part by thinning a substrate to expose the second surface of the sensitive layer such that the second surface of the sensitive layer is able to receive incoming particles.

A charged particle microscope for examining a specimen, comprising:

• an optics column, including a charged particle source and an illuminator for directing a beam of charged particles emitted from said charged particle source onto a specimen;
• a specimen stage positioned downstream of said illuminator and arranged for holding said specimen;
• and
• a detector device for detecting emissions originating from said specimen in response to the incidence of charged particles emitted from said charged particle source, the detector device comprising:
• a sensor device having a sensitive layer and a passivation layer, the sensitive layer having a first surface which faces the passivation layer and a second surface that is opposite the first surface;
• and
• a mechanical supporting layer connected to said sensor device in such a way that the passivation layer is situated in between said sensitive layer and said mechanical supporting layer, wherein the mechanical supporting layer is provided so that the first surface of the sensitive layer faces the mechanical supporting layer;
• and
• wherein the charged particle detector is formed at least in part by thinning a substrate to expose the second surface of the sensitive layer such that the second surface of the sensitive layer is able to receive incoming particles.